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Total properties:
22
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Patent #:
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Issue Dt:
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11/10/2009
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Application #:
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11298385
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Filing Dt:
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12/08/2005
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Publication #:
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Pub Dt:
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11/23/2006
| | | | |
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Title:
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PHOTORESIST COATING COMPOSITION AND METHOD FOR FORMING FINE PATTERN USING THE SAME
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Patent #:
|
|
Issue Dt:
|
02/06/2018
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Application #:
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14440414
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Filing Dt:
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05/04/2015
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Publication #:
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Pub Dt:
|
10/01/2015
| | | | |
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Title:
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COATING COMPOSITION FOR PREVENTING COLLAPSE OF CAPACITOR
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Patent #:
|
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Issue Dt:
|
11/28/2017
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Application #:
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15181521
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Filing Dt:
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06/14/2016
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Publication #:
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Pub Dt:
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01/19/2017
| | | | |
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Title:
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CLEANING COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME
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Patent #:
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Issue Dt:
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12/25/2018
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Application #:
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15744667
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Filing Dt:
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01/12/2018
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Publication #:
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Pub Dt:
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07/19/2018
| | | | |
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Title:
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NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER FOR FORMING SEMICONDUCTOR PATTERNS
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Patent #:
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Issue Dt:
|
01/21/2020
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Application #:
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15753746
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Filing Dt:
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02/20/2018
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Publication #:
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Pub Dt:
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08/30/2018
| | | | |
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Title:
|
I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHING RESISTANCE
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|
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Patent #:
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Issue Dt:
|
01/07/2020
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Application #:
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15762871
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Filing Dt:
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03/23/2018
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Publication #:
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Pub Dt:
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08/16/2018
| | | | |
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Title:
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SLURRY COMPOSITION FOR CMP AND POLISHING METHOD USING SAME
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|
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Patent #:
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Issue Dt:
|
07/21/2020
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Application #:
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16070662
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Filing Dt:
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07/17/2018
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Publication #:
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Pub Dt:
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11/08/2018
| | | | |
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Title:
|
ANTI-REFLECTION COATING COMPOSITION AND ANTI-REFLECTION FILM UTILIZING SAME
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|
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Patent #:
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Issue Dt:
|
09/15/2020
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Application #:
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16086485
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Filing Dt:
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09/19/2018
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Publication #:
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Pub Dt:
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04/04/2019
| | | | |
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Title:
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NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO
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|
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Patent #:
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Issue Dt:
|
02/21/2023
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Application #:
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16098706
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Filing Dt:
|
11/02/2018
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Publication #:
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Pub Dt:
|
05/09/2019
| | | | |
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Title:
|
CHEMICALLY-AMPLIFIED-TYPE NEGATIVE-TYPE PHOTORESIST COMPOSITION
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|
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Patent #:
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Issue Dt:
|
11/09/2021
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Application #:
|
16098771
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Filing Dt:
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11/02/2018
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Publication #:
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Pub Dt:
|
06/11/2020
| | | | |
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Title:
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METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING NEGATIVE TONE PHOTORESIST
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|
|
|
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Patent #:
|
|
Issue Dt:
|
11/30/2021
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Application #:
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16098794
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Filing Dt:
|
11/02/2018
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|
Publication #:
|
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Pub Dt:
|
05/09/2019
| | | | |
|
Title:
|
METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING NEGATIVE TONE PHOTORESIST
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|
|
|
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Patent #:
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|
Issue Dt:
|
04/05/2022
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Application #:
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16304095
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Filing Dt:
|
11/21/2018
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|
Publication #:
|
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Pub Dt:
|
04/09/2020
| | | | |
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Title:
|
PHOTORESIST PATTERN SHRINKING COMPOSITION AND PATTERN SHRINKING METHOD
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|
|
|
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Patent #:
|
|
Issue Dt:
|
06/15/2021
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Application #:
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16341244
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Filing Dt:
|
04/11/2019
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Publication #:
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Pub Dt:
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08/22/2019
| | | | |
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Title:
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HIGH ETCH RESISTANCE SPIN-ON CARBON HARD MASK COMPOSITION AND PATTERNING METHOD USING SAME
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|
|
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Patent #:
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Issue Dt:
|
11/24/2020
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Application #:
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16489179
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Filing Dt:
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08/27/2019
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Publication #:
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Pub Dt:
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12/19/2019
| | | | |
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Title:
|
COMPOSITION FOR PERFORMING CLEANING AFTER CHEMICAL/ MECHANICAL POLISHING
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|
|
|
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Patent #:
|
|
Issue Dt:
|
11/09/2021
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Application #:
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16492767
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Filing Dt:
|
09/10/2019
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Publication #:
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|
Pub Dt:
|
03/04/2021
| | | | |
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Title:
|
EUV DEVELOPER COMPOSITION FOR FORMING PHOTOSENSITIVE PHOTORESIST MICROPATTERN
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|
|
|
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Patent #:
|
|
Issue Dt:
|
05/11/2021
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Application #:
|
16609685
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Filing Dt:
|
10/30/2019
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|
Publication #:
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|
Pub Dt:
|
06/18/2020
| | | | |
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Title:
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CUTTING OIL COMPOSITION
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|
|
|
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Patent #:
|
|
Issue Dt:
|
12/14/2021
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Application #:
|
16961407
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Filing Dt:
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07/10/2020
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Publication #:
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Pub Dt:
|
11/19/2020
| | | | |
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Title:
|
DEVELOPER COMPOSITION, FOR EUV LIGHT SOURCE, FOR FORMING PHOTOSENSITIVE PHOTORESIST MICROPATTERN
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|
|
|
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Patent #:
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|
Issue Dt:
|
04/26/2022
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Application #:
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16961450
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Filing Dt:
|
07/10/2020
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|
Publication #:
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Pub Dt:
|
03/18/2021
| | | | |
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Title:
|
NOVEL ETCHING METHOD FOR FORMING MICRO SILICON PATTERN IN SEMICONDUCTOR MANUFACTURING PROCESS
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|
|
|
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Patent #:
|
|
Issue Dt:
|
10/18/2022
|
Application #:
|
17054371
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Filing Dt:
|
11/10/2020
|
|
Publication #:
|
|
Pub Dt:
|
07/15/2021
| | | | |
|
Title:
|
PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY, AND METHOD FOR FORMING PATTERN BY USING SAME
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|
|
|
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Patent #:
|
|
Issue Dt:
|
11/01/2022
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Application #:
|
17294865
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Filing Dt:
|
05/18/2021
|
|
Publication #:
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Pub Dt:
|
01/13/2022
| | | | |
|
Title:
|
PROCESS LIQUID FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND PATTERN FORMING METHOD USING SAME
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/01/2022
|
Application #:
|
17423334
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Filing Dt:
|
07/15/2021
|
|
Publication #:
|
|
Pub Dt:
|
03/31/2022
| | | | |
|
Title:
|
NOVEL METHOD FOR FORMING SILICON OR SILICON COMPOUND PATTERN IN SEMICONDUCTOR MANUFACTURING PROCESS
|
|
|
|
|
Patent #:
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|
Issue Dt:
|
01/17/2023
|
Application #:
|
17430480
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Filing Dt:
|
08/12/2021
|
|
Publication #:
|
|
Pub Dt:
|
04/28/2022
| | | | |
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Title:
|
ETCHING COMPOSITION FOR SILICON NITRIDE FILM
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|
