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Total properties:
13
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Patent #:
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|
Issue Dt:
|
09/11/2001
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Application #:
|
09009369
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Filing Dt:
|
01/20/1998
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Title:
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METHOD FOR USING A HARD MASK FOR CRITICAL DIMENSION GROWTH CONTAINMENT
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|
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Patent #:
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|
Issue Dt:
|
12/28/1999
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Application #:
|
09204020
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Filing Dt:
|
12/01/1998
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|
Title:
|
PLASMA REACTOR WITH A DEPOSITION SHIELD
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|
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Patent #:
|
|
Issue Dt:
|
03/26/2002
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Application #:
|
09382050
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Filing Dt:
|
08/24/1999
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Title:
|
PLASMA REACTOR WITH A DEPOSITION SHIELD
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|
|
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Patent #:
|
|
Issue Dt:
|
01/16/2001
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Application #:
|
09434092
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Filing Dt:
|
11/05/1999
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Title:
|
PLASMA REACTOR WITH A DEPOSITION SHIELD
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|
|
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Patent #:
|
|
Issue Dt:
|
01/09/2001
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Application #:
|
09434990
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Filing Dt:
|
11/05/1999
|
|
Title:
|
PLASMA REACTOR WITH A DEPOSITION SHIELD
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|
|
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Patent #:
|
|
Issue Dt:
|
08/13/2002
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Application #:
|
09634988
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Filing Dt:
|
08/08/2000
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|
Title:
|
PLASMA VACUUM SUBSTRATE TREATMENT PROCESS AND SYSTEM
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Patent #:
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|
Issue Dt:
|
10/25/2005
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Application #:
|
09692007
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Filing Dt:
|
10/19/2000
|
|
Title:
|
METHOD FOR USING A HARD MASK FOR CRITICAL DIMENSION GROWTH CONTAINMENT
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/18/2003
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Application #:
|
09881425
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Filing Dt:
|
06/14/2001
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Publication #:
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Pub Dt:
|
10/18/2001
| | | | |
|
Title:
|
DEPOSITION SHIELD FOR A PLASMA REACTOR
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|
|
|
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Patent #:
|
|
Issue Dt:
|
10/04/2005
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Application #:
|
10045318
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Filing Dt:
|
11/09/2001
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|
Publication #:
|
|
Pub Dt:
|
09/19/2002
| | | | |
|
Title:
|
METHOD FOR USING A HARD MASK FOR CRITICAL DIMENSION GROWTH CONTAINMENT
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/06/2006
|
Application #:
|
10902582
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Filing Dt:
|
07/30/2004
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|
Publication #:
|
|
Pub Dt:
|
02/03/2005
| | | | |
|
Title:
|
METHOD AND APPARATUS FOR NON-AGGRESSIVE PLASMA-ENHANCED VAPOR DEPOSITION OF DIELECTRIC FILMS
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|
|
|
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Patent #:
|
|
Issue Dt:
|
02/22/2011
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Application #:
|
11319506
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Filing Dt:
|
12/29/2005
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|
Publication #:
|
|
Pub Dt:
|
08/10/2006
| | | | |
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Title:
|
APPARATUS AND A METHOD FOR CONTROLLING THE DEPTH OF ETCHING DURING ALTERNATING PLASMA ETCHING OF SEMICONDUCTOR SUBSTRATES
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|
|
|
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Patent #:
|
|
Issue Dt:
|
07/15/2008
|
Application #:
|
11451443
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Filing Dt:
|
06/13/2006
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|
Publication #:
|
|
Pub Dt:
|
12/14/2006
| | | | |
|
Title:
|
METHOD OF CONTROLLING THE PRESSURE IN A PROCESS CHAMBER
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|
|
|
|
Patent #:
|
NONE
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Issue Dt:
|
|
Application #:
|
12712339
|
Filing Dt:
|
02/25/2010
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|
Publication #:
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|
Pub Dt:
|
08/25/2011
| | | | |
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Title:
|
Method of forming and patterning conformal insulation layer in vias and etched structures
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