Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Reel/Frame: | 015855/0196 | |
| Pages: | 3 |
| | Recorded: | 09/28/2004 | | |
Attorney Dkt #: | 2516131030 |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
|
Total properties:
1
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10952293
|
Filing Dt:
|
09/28/2004
|
Publication #:
|
|
Pub Dt:
|
01/19/2006
| | | | |
Title:
|
Method for improving atomic layer deposition process and the device thereof
|
|
Assignee
|
|
|
3F, NO. 19, LI HSIN RD. |
SCIENCE BASED INDUSTRIAL PARK |
HSINCHU, TAIWAN R.O.C. |
|
Correspondence name and address
|
|
THOMAS KAYDEN HORSTEMEYER, ET AL.
|
|
DANIEL R. MCCLURE
|
|
100 GALLERIA PARKWAY
|
|
SUITE 1750
|
|
ATLANTA, GA 30339-5948
|
Search Results as of:
05/29/2024 06:16 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|