Total properties:
73
|
|
Patent #:
|
|
Issue Dt:
|
09/30/1997
|
Application #:
|
08438261
|
Filing Dt:
|
05/10/1995
|
Title:
|
INTEGRATED SEMICONDUCTOR WAFER PROCESSING SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
11/16/1999
|
Application #:
|
08450369
|
Filing Dt:
|
05/25/1995
|
Title:
|
PLASMA ETCH SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
08/12/2003
|
Application #:
|
08564659
|
Filing Dt:
|
11/29/1995
|
Title:
|
APPARATUS FOR, AND METHOD OF, DEPOSITING A FILM ON A SUBSTRATE
|
|
|
Patent #:
|
|
Issue Dt:
|
06/22/1999
|
Application #:
|
08651377
|
Filing Dt:
|
05/22/1996
|
Title:
|
APPARATUS FOR, AND METHOD OF, REMOVING HYDROCARBONS FROM THE SURFACE OF A SUBSTRATE
|
|
|
Patent #:
|
|
Issue Dt:
|
04/11/2000
|
Application #:
|
08675093
|
Filing Dt:
|
07/03/1996
|
Title:
|
PLASMA ETCH REACTOR AND METHOD FOR EMERGING FILMS
|
|
|
Patent #:
|
|
Issue Dt:
|
12/31/2002
|
Application #:
|
08675559
|
Filing Dt:
|
07/03/1996
|
Title:
|
PLASMA ETCH REACTOR AND METHOD
|
|
|
Patent #:
|
|
Issue Dt:
|
10/03/2000
|
Application #:
|
08742861
|
Filing Dt:
|
11/01/1996
|
Title:
|
METHOD AND APPARATUS FOR ETCHING A SEMICONDUCTOR WAFER WITH FEATURES HAVING VERTICAL SIDEWALLS
|
|
|
Patent #:
|
|
Issue Dt:
|
09/28/1999
|
Application #:
|
08850224
|
Filing Dt:
|
05/02/1997
|
Title:
|
PLASMA ETCH SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
06/05/2001
|
Application #:
|
08853649
|
Filing Dt:
|
05/09/1997
|
Title:
|
METHODS FOR CLEANING SEMICONDUCTOR SURFACES
|
|
|
Patent #:
|
|
Issue Dt:
|
08/08/2000
|
Application #:
|
08897914
|
Filing Dt:
|
07/21/1997
|
Title:
|
MOTOR DRIVE ASSEMBLY FOR A SEMICONDUCTOR WAFER PROCESSING SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
04/04/2000
|
Application #:
|
08974089
|
Filing Dt:
|
11/19/1997
|
Title:
|
A METHOD FOR MINIMIZING THE CRITICAL DIMENSION GROWTH OF A FEATURE ON A SEMICONDUCTOR WAFER
|
|
|
Patent #:
|
|
Issue Dt:
|
11/09/1999
|
Application #:
|
09099309
|
Filing Dt:
|
06/18/1998
|
Title:
|
ALKALINE WATER-BASED SOLUTION FOR CLEANING METALLIZED MICROELECTRONIC
|
|
|
Patent #:
|
|
Issue Dt:
|
08/13/2002
|
Application #:
|
09113440
|
Filing Dt:
|
07/10/1998
|
Publication #:
|
|
Pub Dt:
|
12/06/2001
| | | | |
Title:
|
CLEANING APPARATUS
|
|
|
Patent #:
|
|
Issue Dt:
|
02/12/2002
|
Application #:
|
09135210
|
Filing Dt:
|
08/17/1998
|
Title:
|
METHOD AND APPARATUS FOR MINIMIZING SEMICONDUCTOR WAFER ARCING DURING SEMICONDUCTOR WAFER PROCESSING
|
|
|
Patent #:
|
|
Issue Dt:
|
03/12/2002
|
Application #:
|
09152238
|
Filing Dt:
|
09/11/1998
|
Title:
|
PLASMA ETCH REACTOR HAVING A PLURALITY OF MAGNETS (AS AMENDED)
|
|
|
Patent #:
|
|
Issue Dt:
|
11/27/2001
|
Application #:
|
09362157
|
Filing Dt:
|
07/28/1999
|
Title:
|
WAFER CONTAINER CLEANING SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
03/25/2003
|
Application #:
|
09372849
|
Filing Dt:
|
08/12/1999
|
Title:
|
FLUID HEATING SYSTEM FOR PROCESSING SEMICONDUCTOR MATERIALS
|
|
|
Patent #:
|
|
Issue Dt:
|
02/20/2001
|
Application #:
|
09384614
|
Filing Dt:
|
08/27/1999
|
Title:
|
PLASMA ETCH REACTOR AND METHOD FOR EMERGING FILMS
|
|
|
Patent #:
|
|
Issue Dt:
|
09/19/2000
|
Application #:
|
09412873
|
Filing Dt:
|
10/05/1999
|
Title:
|
PLASMA ETCH SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
03/13/2001
|
Application #:
|
09413622
|
Filing Dt:
|
10/06/1999
|
Title:
|
VAPOR ASSISTED ROTARY DRYING METHOD AND APPARATUS
|
|
|
Patent #:
|
|
Issue Dt:
|
11/06/2001
|
Application #:
|
09436613
|
Filing Dt:
|
11/09/1999
|
Title:
|
A NON- CORROSIVE CLEANING METHOD FOR USE IN THE MANUFACTURE OF MICROELECTRONIC DEVICES
|
|
|
Patent #:
|
|
Issue Dt:
|
11/26/2002
|
Application #:
|
09454814
|
Filing Dt:
|
12/03/1999
|
Title:
|
COBALT SILICIDE ETCH PROCESS AND APPARATUS
|
|
|
Patent #:
|
|
Issue Dt:
|
09/16/2003
|
Application #:
|
09455641
|
Filing Dt:
|
12/07/1999
|
Title:
|
PLASMA ETCH REACTOR AND METHOD
|
|
|
Patent #:
|
|
Issue Dt:
|
01/01/2002
|
Application #:
|
09503784
|
Filing Dt:
|
02/14/2000
|
Title:
|
Seal configuration for use with a motor drive assembly in a microelectronic workpiece processing system
|
|
|
Patent #:
|
|
Issue Dt:
|
12/10/2002
|
Application #:
|
09517387
|
Filing Dt:
|
03/02/2000
|
Title:
|
METHOD AND APPARATUS FOR ETCHING A SEMICONDUCTOR WAFER WITH FEATURES HAVING VERTICAL SIDEWALLS
|
|
|
Patent #:
|
|
Issue Dt:
|
03/09/2004
|
Application #:
|
09536251
|
Filing Dt:
|
03/27/2000
|
Title:
|
METHOD FOR TREATING THE SURFACE OF A WORKPIECE
|
|
|
Patent #:
|
|
Issue Dt:
|
09/10/2002
|
Application #:
|
09609879
|
Filing Dt:
|
07/05/2000
|
Title:
|
CHEMICAL SOLUTIONS SYSTEM FOR PROCESSING SEMICONDUCTOR MATERIALS
|
|
|
Patent #:
|
|
Issue Dt:
|
06/25/2002
|
Application #:
|
09610175
|
Filing Dt:
|
07/05/2000
|
Title:
|
SEAL CONFIGURATION FOR USE W ITH A MOTOR DRIVE ASSEMBLY IN A MICROELECTRONIC WORK PIECE PROCESSING SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
07/16/2002
|
Application #:
|
09611537
|
Filing Dt:
|
07/07/2000
|
Title:
|
DUAL CASSETTE CENTRIFUGAL PROCESSOR
|
|
|
Patent #:
|
|
Issue Dt:
|
07/02/2002
|
Application #:
|
09611642
|
Filing Dt:
|
07/07/2000
|
Title:
|
WAFER CONTAINER CLEANING SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
03/22/2005
|
Application #:
|
09621028
|
Filing Dt:
|
07/21/2000
|
Title:
|
PROCESS AND APPARATUS FOR TREATING A WORKPIECE SUCH AS A SEMICONDUCTOR WAFER
|
|
|
Patent #:
|
|
Issue Dt:
|
09/28/2004
|
Application #:
|
09658395
|
Filing Dt:
|
09/08/2000
|
Title:
|
SPRAY NOZZLE SYSTEM FOR A SEMICONDUCTOR WAFER CONTAINER CLEANING APARATUS
|
|
|
Patent #:
|
|
Issue Dt:
|
07/15/2003
|
Application #:
|
09677925
|
Filing Dt:
|
10/03/2000
|
Title:
|
APPARATUS AND METHOD FOR PROCESSING THE SURFACE OF A WORKPIECE WIH OZONE
|
|
|
Patent #:
|
|
Issue Dt:
|
08/14/2001
|
Application #:
|
09677929
|
Filing Dt:
|
10/03/2000
|
Title:
|
Apparatus and method for processing the surface of a workpiece with ozone
|
|
|
Patent #:
|
|
Issue Dt:
|
07/31/2001
|
Application #:
|
09677934
|
Filing Dt:
|
10/03/2000
|
Title:
|
Apparatus and method for processing the surface of a workpiece with ozone
|
|
|
Patent #:
|
|
Issue Dt:
|
03/26/2002
|
Application #:
|
09778579
|
Filing Dt:
|
02/07/2001
|
Publication #:
|
|
Pub Dt:
|
07/19/2001
| | | | |
Title:
|
Solution for cleaning metallized microelectronic workpieces and methods of using same
|
|
|
Patent #:
|
|
Issue Dt:
|
05/13/2003
|
Application #:
|
09798048
|
Filing Dt:
|
03/05/2001
|
Publication #:
|
|
Pub Dt:
|
01/03/2002
| | | | |
Title:
|
DUAL DEGAS/COOL LOADLOCK CLUSTER TOOL
|
|
|
Patent #:
|
|
Issue Dt:
|
12/14/2004
|
Application #:
|
09811925
|
Filing Dt:
|
03/19/2001
|
Publication #:
|
|
Pub Dt:
|
10/18/2001
| | | | |
Title:
|
METHODS FOR CLEANING SEMICONDUCTOR SURFACES
|
|
|
Patent #:
|
|
Issue Dt:
|
12/23/2008
|
Application #:
|
09829587
|
Filing Dt:
|
04/09/2001
|
Publication #:
|
|
Pub Dt:
|
01/23/2003
| | | | |
Title:
|
SYSTEM FOR, AND METHOD OF, ETCHING A SURFACE ON A WAFER
|
|
|
Patent #:
|
|
Issue Dt:
|
08/05/2003
|
Application #:
|
09837722
|
Filing Dt:
|
04/18/2001
|
Publication #:
|
|
Pub Dt:
|
11/22/2001
| | | | |
Title:
|
APPARATUS AND METHOD FOR DELIVERING A TREATMENT LIQUID AND OZONE TO TREAT THE SURFACE OF A WORKPIECE
|
|
|
Patent #:
|
|
Issue Dt:
|
08/10/2004
|
Application #:
|
09880584
|
Filing Dt:
|
06/13/2001
|
Publication #:
|
|
Pub Dt:
|
10/18/2001
| | | | |
Title:
|
METHOD FOR MINIMIZING THE CRITICAL DIMENSION GROWTH OF A FEATURE ON A SEMICONDUCTOR WAFER
|
|
|
Patent #:
|
|
Issue Dt:
|
10/21/2008
|
Application #:
|
09888365
|
Filing Dt:
|
06/22/2001
|
Publication #:
|
|
Pub Dt:
|
03/28/2002
| | | | |
Title:
|
REACTOR WITH HEATED AND TEXTURED ELECTRODES AND SURFACES
|
|
|
Patent #:
|
|
Issue Dt:
|
12/24/2002
|
Application #:
|
09929312
|
Filing Dt:
|
08/14/2001
|
Publication #:
|
|
Pub Dt:
|
05/02/2002
| | | | |
Title:
|
PROCESS FOR TREATING A WORKPIECE WITH HYDROFLUORIC ACID AND OZONE
|
|
|
Patent #:
|
|
Issue Dt:
|
06/24/2003
|
Application #:
|
09929437
|
Filing Dt:
|
08/14/2001
|
Publication #:
|
|
Pub Dt:
|
02/21/2002
| | | | |
Title:
|
METHODS FOR PROCESSING A WORKPIECE USING STEAM AND OZONE
|
|
|
Patent #:
|
|
Issue Dt:
|
06/14/2005
|
Application #:
|
10043716
|
Filing Dt:
|
01/09/2002
|
Publication #:
|
|
Pub Dt:
|
08/01/2002
| | | | |
Title:
|
METHOD AND APPARATUS FOR CLEANING CONTAINERS
|
|
|
Patent #:
|
|
Issue Dt:
|
04/24/2007
|
Application #:
|
10051886
|
Filing Dt:
|
01/16/2002
|
Publication #:
|
|
Pub Dt:
|
07/17/2003
| | | | |
Title:
|
PERMANENT ADHERENCE OF THE BACK END OF A WAFER TO AN ELECTRICAL COMPONENT OR SUB-ASSEMBLY
|
|
|
Patent #:
|
|
Issue Dt:
|
02/17/2004
|
Application #:
|
10108278
|
Filing Dt:
|
03/26/2002
|
Publication #:
|
|
Pub Dt:
|
07/25/2002
| | | | |
Title:
|
WAFER CONTAINER CLEANING SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
06/14/2005
|
Application #:
|
10156478
|
Filing Dt:
|
05/28/2002
|
Publication #:
|
|
Pub Dt:
|
10/03/2002
| | | | |
Title:
|
PLASMA ETCH REACTOR AND METHOD
|
|
|
Patent #:
|
|
Issue Dt:
|
12/09/2003
|
Application #:
|
10164164
|
Filing Dt:
|
06/05/2002
|
Publication #:
|
|
Pub Dt:
|
12/05/2002
| | | | |
Title:
|
DUAL CASSETTE CENTRIFUGAL PROCESSOR
|
|
|
Patent #:
|
|
Issue Dt:
|
12/11/2007
|
Application #:
|
10199998
|
Filing Dt:
|
07/19/2002
|
Publication #:
|
|
Pub Dt:
|
06/05/2003
| | | | |
Title:
|
CENTRIFUGAL SPRAY PROCESSOR AND RETROFIT KIT
|
|
|
Patent #:
|
|
Issue Dt:
|
05/11/2004
|
Application #:
|
10205776
|
Filing Dt:
|
07/26/2002
|
Publication #:
|
|
Pub Dt:
|
12/12/2002
| | | | |
Title:
|
CHEMICAL SOLUTIONS METHODS FOR PROCESSING SEMICONDUCTOR MATERIALS
|
|
|
Patent #:
|
|
Issue Dt:
|
12/14/2004
|
Application #:
|
10286317
|
Filing Dt:
|
11/01/2002
|
Publication #:
|
|
Pub Dt:
|
05/06/2004
| | | | |
Title:
|
WAFER CONTAINER CLEANING SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
05/18/2004
|
Application #:
|
10359844
|
Filing Dt:
|
02/06/2003
|
Publication #:
|
|
Pub Dt:
|
06/26/2003
| | | | |
Title:
|
FLUID HEATING SYSTEM FOR PROCESSING SEMICONDUCTOR MATERIALS
|
|
|
Patent #:
|
|
Issue Dt:
|
01/04/2005
|
Application #:
|
10418695
|
Filing Dt:
|
04/18/2003
|
Publication #:
|
|
Pub Dt:
|
11/06/2003
| | | | |
Title:
|
APPARATUS FOR TREATING A WORKPIECE WITH STEAM AND OZONE
|
|
|
Patent #:
|
|
Issue Dt:
|
11/16/2004
|
Application #:
|
10420659
|
Filing Dt:
|
04/21/2003
|
Publication #:
|
|
Pub Dt:
|
11/06/2003
| | | | |
Title:
|
METHOD FOR PROCESSING THE SURFACE OF A WORKPIECE
|
|
|
Patent #:
|
|
Issue Dt:
|
02/20/2007
|
Application #:
|
10446005
|
Filing Dt:
|
05/23/2003
|
Publication #:
|
|
Pub Dt:
|
11/25/2004
| | | | |
Title:
|
REACTIVE SPUTTERING OF SILICON NITRIDE FILMS BY RF SUPPORTED DC MAGNETRON
|
|
|
Patent #:
|
|
Issue Dt:
|
07/29/2008
|
Application #:
|
10631376
|
Filing Dt:
|
07/30/2003
|
Publication #:
|
|
Pub Dt:
|
02/05/2004
| | | | |
Title:
|
METHODS OF THINNING A SILICON WAFER USING HF AND OZONE
|
|
|
Patent #:
|
|
Issue Dt:
|
09/18/2007
|
Application #:
|
10633839
|
Filing Dt:
|
08/04/2003
|
Publication #:
|
|
Pub Dt:
|
02/26/2004
| | | | |
Title:
|
SYSTEM FOR, AND METHOD OF, ETCHING A SURFACE ON A WAFER
|
|
|
Patent #:
|
|
Issue Dt:
|
01/18/2005
|
Application #:
|
10681553
|
Filing Dt:
|
10/07/2003
|
Publication #:
|
|
Pub Dt:
|
04/15/2004
| | | | |
Title:
|
METHODS FOR CLEANING SEMICONDUCTOR SURFACES
|
|
|
Patent #:
|
|
Issue Dt:
|
03/22/2005
|
Application #:
|
10692829
|
Filing Dt:
|
10/23/2003
|
Publication #:
|
|
Pub Dt:
|
04/29/2004
| | | | |
Title:
|
METHODS FOR REMOVING METALLIC CONTAMINATION FROM WAFER CONTAINERS
|
|
|
Patent #:
|
|
Issue Dt:
|
09/04/2007
|
Application #:
|
10859668
|
Filing Dt:
|
06/03/2004
|
Publication #:
|
|
Pub Dt:
|
11/04/2004
| | | | |
Title:
|
PROCESS AND APPARATUS FOR TREATING A WORKPIECE USING OZONE
|
|
|
Patent #:
|
|
Issue Dt:
|
08/26/2008
|
Application #:
|
10870173
|
Filing Dt:
|
06/18/2004
|
Publication #:
|
|
Pub Dt:
|
11/11/2004
| | | | |
Title:
|
PROCESS AND APPARATUS FOR TREATING A WORKPIECE WITH GASES
|
|
|
Patent #:
|
|
Issue Dt:
|
06/13/2006
|
Application #:
|
10917750
|
Filing Dt:
|
08/12/2004
|
Publication #:
|
|
Pub Dt:
|
01/20/2005
| | | | |
Title:
|
METHODS FOR CLEANING WAFER CONTAINERS
|
|
|
Patent #:
|
|
Issue Dt:
|
01/30/2007
|
Application #:
|
10937660
|
Filing Dt:
|
09/09/2004
|
Publication #:
|
|
Pub Dt:
|
03/09/2006
| | | | |
Title:
|
SYSTEM AND METHOD FOR PROCESSING A WAFER INCLUDING STOP-ON-ALUMINA PROCESSING
|
|
|
Patent #:
|
|
Issue Dt:
|
01/16/2007
|
Application #:
|
11005495
|
Filing Dt:
|
12/06/2004
|
Publication #:
|
|
Pub Dt:
|
06/23/2005
| | | | |
Title:
|
PROCESSING A WORKPIECE USING WATER, A BASE, AND OZONE
|
|
|
Patent #:
|
|
Issue Dt:
|
05/29/2007
|
Application #:
|
11087540
|
Filing Dt:
|
03/23/2005
|
Publication #:
|
|
Pub Dt:
|
07/28/2005
| | | | |
Title:
|
PLASMA ETCH REACTOR AND METHOD
|
|
|
Patent #:
|
|
Issue Dt:
|
05/27/2008
|
Application #:
|
11127052
|
Filing Dt:
|
05/11/2005
|
Publication #:
|
|
Pub Dt:
|
10/27/2005
| | | | |
Title:
|
SYSTEM AND METHODS FOR POLISHING A WAFER
|
|
|
Patent #:
|
|
Issue Dt:
|
04/21/2009
|
Application #:
|
11294921
|
Filing Dt:
|
12/05/2005
|
Publication #:
|
|
Pub Dt:
|
06/07/2007
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Title:
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APPARATUS AND METHOD FOR CLEANING AND DRYING A CONTAINER FOR SEMICONDUCTOR WORKPIECES
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Patent #:
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Issue Dt:
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01/12/2010
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Application #:
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11724556
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Filing Dt:
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03/14/2007
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Publication #:
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Pub Dt:
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07/05/2007
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Title:
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DRY ETCH STOP PROCESS FOR ELIMINATING ELECTRICAL SHORTING IN MRAM DEVICE STRUCTURES
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Patent #:
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Issue Dt:
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08/19/2014
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Application #:
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12411301
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Filing Dt:
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03/25/2009
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Publication #:
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Pub Dt:
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10/01/2009
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Title:
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Stress adjustment in reactive sputtering
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Patent #:
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Issue Dt:
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04/08/2014
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Application #:
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12411357
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Filing Dt:
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03/25/2009
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Publication #:
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Pub Dt:
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10/01/2009
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Title:
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Stress adjustment in reactive sputtering
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Patent #:
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Issue Dt:
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06/07/2011
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Application #:
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12552664
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Filing Dt:
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09/02/2009
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Publication #:
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Pub Dt:
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01/28/2010
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Title:
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DRY ETCH STOP PROCESS FOR ELIMINATING ELECTRICAL SHORTING IN MRAM DEVICE STRUCTURES
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Patent #:
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Issue Dt:
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07/09/2013
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Application #:
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12786238
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Filing Dt:
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05/24/2010
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Publication #:
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Pub Dt:
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12/02/2010
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Title:
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SPUTTER DEPOSITION OF CERMET RESISTOR FILMS WITH LOW TEMPERATURE COEFFICIENT OF RESISTANCE
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