Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
| Reel/Frame: | 018283/0246 | |
| Pages: | 3 |
| | Recorded: | 09/21/2006 | | |
| Attorney Dkt #: | 19561-US-PA |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
|
|
Total properties:
1
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
11309739
|
Filing Dt:
|
09/21/2006
|
|
Publication #:
|
|
Pub Dt:
|
03/27/2008
| | | | |
|
Title:
|
METHOD FOR FORMING SILICON-GERMANIUM EPITAXIAL LAYER
|
|
|
Assignee
|
|
|
|
|
| NO. 3, LI-HSIN RD. II, SCIENCE-BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN |
|
|
Correspondence name and address
|
| |
JIANQ CHYUN INTELLECTUAL PROPERTY OFFICE
|
| |
7 FLOOR-1, NO. 100
|
| |
ROOSEVELT ROAD, SECTION 2
|
| |
TAIPEI, TAIWAN 100
|
Search Results as of:
05/24/2024 12:40 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
