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Reel/Frame:057163/0250   Pages: 7
Recorded: 08/12/2021
Attorney Dkt #:28744-5369 (191022.1)
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 1
1
Patent #:
NONE
Issue Dt:
Application #:
17400722
Filing Dt:
08/12/2021
Publication #:
Pub Dt:
02/24/2022
Title:
WINDOW FOR CHEMICAL VAPOR DEPOSITION SYSTEMS AND RELATED METHODS
Assignors
1
Exec Dt:
03/03/2021
2
Exec Dt:
09/15/2020
3
Exec Dt:
01/29/2021
Assignee
1
NO. 8. INDUSTRIAL ROAD 2,
SCIENCE-BASED INDUSTRIAL PARK
HSINCHU, TAIWAN
Correspondence name and address
RICHARD A. SCHUTH
ARMSTRONG TEASDALE LLP
7700 FORSYTH BLVD., SUITE 1800
ST. LOUIS, MO 63105

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