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Total properties:
20
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Patent #:
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Issue Dt:
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09/20/1988
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Application #:
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06881628
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Filing Dt:
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07/03/1986
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Title:
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GAS TREATMENT APPARATUS AND METHOD
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Patent #:
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|
Issue Dt:
|
12/22/1987
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Application #:
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06903885
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Filing Dt:
|
09/03/1986
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Title:
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MODULAR GAS HANDLING APPARATUS
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Patent #:
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Issue Dt:
|
06/13/1989
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Application #:
|
07169621
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Filing Dt:
|
03/18/1988
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Title:
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GAS TREATMENT APPARATUS AND METHOD
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Patent #:
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Issue Dt:
|
11/13/1990
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Application #:
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07488393
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Filing Dt:
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02/27/1990
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Title:
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GAS TREATMENT APPARATUS AND METHOD
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Patent #:
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Issue Dt:
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08/09/1994
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Application #:
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07803647
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Filing Dt:
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12/04/1991
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Title:
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APPARATUS FOR DEPOSITING A COATING ON A SUBSTRATE
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Patent #:
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Issue Dt:
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08/13/1996
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Application #:
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08247659
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Filing Dt:
|
05/23/1994
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Title:
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APPARATUS FOR DEPOSITING A COATING ON A SUBSTRATE
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Patent #:
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Issue Dt:
|
12/14/1999
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Application #:
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08723682
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Filing Dt:
|
09/30/1996
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Title:
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WAFER CARRIERS FOR EPITAXIAL GROWTH PROCESSES
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|
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Patent #:
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Issue Dt:
|
11/10/1998
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Application #:
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08724766
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Filing Dt:
|
10/03/1996
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Title:
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LIQUID VAPORIZER SYSTEM AND METHOD
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|
|
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Patent #:
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Issue Dt:
|
06/02/1998
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Application #:
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08885711
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Filing Dt:
|
06/30/1997
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Title:
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CVD REACTOR FOR UNIFORM HEATING WITH RADIANT HEATING FILAMENTS
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Patent #:
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Issue Dt:
|
11/10/1998
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Application #:
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08890041
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Filing Dt:
|
07/09/1997
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|
Title:
|
LIQUID VAPORIZER SYSTEM AND METHOD
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|
|
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Patent #:
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|
Issue Dt:
|
06/27/2000
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Application #:
|
09146224
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Filing Dt:
|
09/02/1998
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Title:
|
CHEMICAL VAPOR DEPOSITION CHAMBER HAVING AN ADJUSTABLE FLOW FLANGE
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Patent #:
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Issue Dt:
|
04/09/2002
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Application #:
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09298079
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Filing Dt:
|
04/23/1999
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Title:
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INDUCTION HEATED CHEMICAL VAPOR DEPOSITION REACTOR
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|
|
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Patent #:
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Issue Dt:
|
02/19/2002
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Application #:
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09321356
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Filing Dt:
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05/27/1999
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|
Title:
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METHOD AND APPARATUS FOR MEASURING THE TEMPERATURE OF OBJECTS ON A FAST MOVING HOLDER
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|
|
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Patent #:
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Issue Dt:
|
03/06/2001
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Application #:
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09345032
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Filing Dt:
|
06/30/1999
|
|
Title:
|
CHEMICAL VAPOR DEPOSITION APPARATUS
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|
|
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Patent #:
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Issue Dt:
|
12/10/2002
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Application #:
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09671527
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Filing Dt:
|
09/27/2000
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Title:
|
APPARATUS AND METHOD FOR CONTROLLING TEMPERATURE UNIFORMITY OF SUBSTRATES
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|
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Patent #:
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Issue Dt:
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01/14/2003
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Application #:
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09778265
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Filing Dt:
|
02/07/2001
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Publication #:
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Pub Dt:
|
08/08/2002
| | | | |
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Title:
|
SUSCEPTORLESS REACTOR FOR GROWING EPITAXIAL LAYERS ON WAFERS BY CHEMICAL VAPOR DEPOSITION
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|
|
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Patent #:
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Issue Dt:
|
04/15/2003
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Application #:
|
09778869
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Filing Dt:
|
02/07/2001
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Publication #:
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Pub Dt:
|
08/08/2002
| | | | |
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Title:
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APPARATUS FOR GROWING EPITAXIAL LAYERS ON WAFERS BY CHEMICAL VAPOR DEPOSITION
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|
|
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Patent #:
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Issue Dt:
|
06/07/2005
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Application #:
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10046426
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Filing Dt:
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01/16/2002
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Publication #:
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Pub Dt:
|
12/12/2002
| | | | |
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Title:
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REACTOR HAVING A MOVABLE SHUTTER
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|
|
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Patent #:
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Issue Dt:
|
02/03/2004
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Application #:
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10268464
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Filing Dt:
|
10/10/2002
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Publication #:
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Pub Dt:
|
03/13/2003
| | | | |
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Title:
|
SUSCEPTORLESS REACTOR FOR GROWING EPITAXIAL LAYERS ON WAFERS BY CHEMICAL VAPOR DEPOSITION
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Patent #:
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Issue Dt:
|
04/27/2004
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Application #:
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10304646
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Filing Dt:
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11/26/2002
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Publication #:
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Pub Dt:
|
06/19/2003
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Title:
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SUSCEPTORLESS REACTOR FOR GROWING EPITAXIAL LAYERS ON WAFERS BY CHEMICAL VAPOR DEPOSITION
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