Patent Assignment Details
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| Reel/Frame: | 018874/0276 | |
| Pages: | 3 |
| | Recorded: | 01/30/2007 | | |
| Attorney Dkt #: | CU-5514 RJS |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11658961
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Filing Dt:
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01/30/2007
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Publication #:
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Pub Dt:
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01/08/2009
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Title:
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Remote Plasma Atomic Layer Deposition Apparatus and Method Using Dc Bias
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Assignee
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| 17 HAENGDANG1-DONG, SEONGDONG-GU |
| SEOUL, KOREA, REPUBLIC OF 133-791 |
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Correspondence name and address
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RICHARD J. STREIT
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C/O LADAS & PARRY LLP
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224 SOUTH MICHIGAN AVENUE
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CHICAGO, ILLINOIS 60604
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