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Reel/Frame:	042524/0283			Pages:	7
		Recorded:	05/22/2017
Attorney Dkt #:	4551
Conveyance:	CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).

Total properties: 73

Patent #:	4565157	Issue Dt:	01/21/1986	Application #:	06480030	Filing Dt:	03/29/1983
Title:	METHOD AND APPARATUS FOR DEPOSITION OF TUNGSTEN SILICIDES

Patent #:	4550684	Issue Dt:	11/05/1985	Application #:	06522638	Filing Dt:	08/11/1983
Title:	COOLED OPTICAL WINDOW FOR SEMICONDUCTOR WAFER HEATING

Patent #:	4629635	Issue Dt:	12/16/1986	Application #:	06590117	Filing Dt:	03/16/1984
Title:	PROCESS FOR DEPOSITING A LOW RESISTIVITY TUNGSTEN SILICON COMPOSITE FILM ON A SUBSTRATE

Patent #:	4597847	Issue Dt:	07/01/1986	Application #:	06658738	Filing Dt:	10/09/1984
Title:	NON-MAGNETIC SPUTTERING TARGET

Patent #:	4680447	Issue Dt:	07/14/1987	Application #:	06756739	Filing Dt:	07/19/1985
Title:	COOLED OPTICAL WINDOW FOR SEMICONDUCTOR WAFER HEATING

Patent #:	4690746	Issue Dt:	09/01/1987	Application #:	06832836	Filing Dt:	02/24/1986
Title:	INTERLAYER DIELECTRIC PROCESS

Patent #:	4778559	Issue Dt:	10/18/1988	Application #:	06919313	Filing Dt:	10/15/1986
Title:	SEMICONDUCTOR SUBSTRATE HEATER AND REACTOR PROCESS AND APPARATUS

Patent #:	4851295	Issue Dt:	07/25/1989	Application #:	06926968	Filing Dt:	11/04/1986
Title:	LOW RESISTIVITY TUNGSTEN SILICON COMPOSITE FILM

Patent #:	4795299	Issue Dt:	01/03/1989	Application #:	07038540	Filing Dt:	04/15/1987
Title:	DIAL DEPOSITION AND PROCESSING APPARATUS

Patent #:	4956046	Issue Dt:	09/11/1990	Application #:	07251108	Filing Dt:	09/29/1988
Title:	SEMICONDUCTOR SUBSTRATE TREATING METHOD

Patent #:	4891335	Issue Dt:	01/02/1990	Application #:	07251115	Filing Dt:	09/29/1988
Title:	SEMICONDUCTOR SUBSTRATE HEATER AND REACTOR PROCESS AND APPARATUS

Patent #:	4938815	Issue Dt:	07/03/1990	Application #:	07257854	Filing Dt:	10/14/1988
Title:	SEMICONDUCTOR SUBSTRATE HEATER AND REACTOR PROCESS AND APPARATUS

Patent #:	5044314	Issue Dt:	09/03/1991	Application #:	07257855	Filing Dt:	10/14/1988
Title:	SEMICONDUCTOR WAFER PROCESSING APPARATUS

Patent #:	4920908	Issue Dt:	05/01/1990	Application #:	07323199	Filing Dt:	03/13/1989
Title:	METHOD AND APPARATUS FOR DEPOSITION OF TUNGSTEN SILICIDES

Patent #:	4932358	Issue Dt:	06/12/1990	Application #:	07354636	Filing Dt:	05/18/1989
Title:	PERIMETER WAFER SEAL

Patent #:	5094885	Issue Dt:	03/10/1992	Application #:	07596512	Filing Dt:	10/12/1990
Title:	DIFFERENTIAL PRESSURE CVD CHUCK

Patent #:	5215639	Issue Dt:	06/01/1993	Application #:	07671164	Filing Dt:	03/14/1991
Title:	COMPOSITE SPUTTERING TARGET STRUCTURES AND PROCESS FOR PRODUCING SUCH STRUCTURES

Patent #:	5431737	Issue Dt:	07/11/1995	Application #:	07830603	Filing Dt:	02/04/1992
Title:	INTERCHANGEABLE CVD CHUCK SURFACE

Patent #:	5294568	Issue Dt:	03/15/1994	Application #:	07867299	Filing Dt:	04/10/1992
Title:	METHOD OF SELECTIVE ETCHING NATIVE OXIDE

Patent #:	5447570	Issue Dt:	09/05/1995	Application #:	07902995	Filing Dt:	06/23/1992
Title:	PURGE GAS IN WAFER COATING AREA SELECTION

Patent #:	5330607	Issue Dt:	07/19/1994	Application #:	07938303	Filing Dt:	08/27/1992
Title:	SACRIFICIAL METAL ETCHBACK SYSTEM

Patent #:	5387289	Issue Dt:	02/07/1995	Application #:	07950088	Filing Dt:	09/22/1992
Title:	FILM UNIFORMITY BY SELECTIVE PRESSURE GRADIENT CONTROL

Patent #:	5272112	Issue Dt:	12/21/1993	Application #:	07973841	Filing Dt:	11/09/1992
Title:	LOW-TEMPERATURE LOW-STRESS BLANKET TUNGSTEN FILM

Patent #:	5762755	Issue Dt:	06/09/1998	Application #:	07994604	Filing Dt:	12/21/1992
Title:	ORGANIC PRECLEAN FOR IMPROVING VAPOR PHASE WAFER ETCH UNIFORMITY

Patent #:	5858471	Issue Dt:	01/12/1999	Application #:	08724967	Filing Dt:	10/03/1996
Title:	SELECTIVE PLASMA DEPOSITION

Patent #:	5963836	Issue Dt:	10/05/1999	Application #:	08759868	Filing Dt:	12/03/1996
Title:	METHODS FOR MINIMIZING AS-DEPOSITED STRESS IN TUNGSTEN SILICIDE FIRMS

Patent #:	5855675	Issue Dt:	01/05/1999	Application #:	08810255	Filing Dt:	03/03/1997
Title:	MULTIPURPOSE PROCESSING CHAMBER FOR CHEMICAL VAPOR DEPOSITION PROCESSES

Patent #:	5879459	Issue Dt:	03/09/1999	Application #:	08920708	Filing Dt:	08/29/1997
Title:	VERTICALLY-STACKED PROCESS REACTOR AND CLUSTER TOOL SYSTEM FOR ATOMIC LAYER DEPOSITION

Patent #:	6174377	Issue Dt:	01/16/2001	Application #:	09225081	Filing Dt:	01/04/1999
Title:	PROCESSING CHAMBER FOR ATOMIC LAYER DEPOSITION PROCESSES

Patent #:	6200893	Issue Dt:	03/13/2001	Application #:	09267953	Filing Dt:	03/11/1999
Title:	RADICAL-ASSISTED SEQUENTIAL CVD

Patent #:	6206972	Issue Dt:	03/27/2001	Application #:	09350417	Filing Dt:	07/08/1999
Title:	METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO SUBSTRATES IN CVD AND PECVD PROCESSES

Patent #:	6130159	Issue Dt:	10/10/2000	Application #:	09365988	Filing Dt:	08/03/1999
Title:	APPARATUS AND METHODS FOR MINIMIZING AS-DEPOSITED STRESS IN TUNGSTEN SILICIDE FILMS

Patent #:	6635570	Issue Dt:	10/21/2003	Application #:	09410109	Filing Dt:	09/30/1999
Title:	PECVD AND CVD PROCESSES FOR WNX DEPOSITION

Patent #:	6305314	Issue Dt:	10/23/2001	Application #:	09466100	Filing Dt:	12/17/1999
Title:	APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION

Patent #:	6503330	Issue Dt:	01/07/2003	Application #:	09470279	Filing Dt:	12/22/1999
Title:	APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION

Patent #:	6551399	Issue Dt:	04/22/2003	Application #:	09480804	Filing Dt:	01/10/2000
Title:	FULLY INTEGRATED PROCESS FOR MIM CAPACITORS USING ATOMIC LAYER DEPOSITION

Patent #:	6479902	Issue Dt:	11/12/2002	Application #:	09609013	Filing Dt:	06/29/2000
Title:	SEMICONDUCTOR CATALYTIC LAYER AND ATOMIC LAYER DEPOSITION THEREOF

Patent #:	6368954	Issue Dt:	04/09/2002	Application #:	09627352	Filing Dt:	07/28/2000
Title:	METHOD OF COPPER INTERCONNECT FORMATION USING ATOMIC LAYER COPPER DEPOSITION

Patent #:	6475910	Issue Dt:	11/05/2002	Application #:	09669063	Filing Dt:	09/22/2000
Title:	RADICAL-ASSISTED SEQUENTIAL CVD

Patent #:	6626998	Issue Dt:	09/30/2003	Application #:	09709228	Filing Dt:	11/08/2000
Title:	PLASMA GENERATOR ASSEMBLY FOR USE IN CVD AND PECVD PROCESSES

Patent #:	6451119	Issue Dt:	09/17/2002	Application #:	09727978	Filing Dt:	11/29/2000
Publication #:	US20010000866	Pub Dt:	05/10/2001
Title:	APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION

Patent #:	6451695	Issue Dt:	09/17/2002	Application #:	09747649	Filing Dt:	12/22/2000
Publication #:	US20010002280	Pub Dt:	05/31/2001
Title:	RADICAL-ASSISTED SEQUENTIAL CVD

Patent #:	6387185	Issue Dt:	05/14/2002	Application #:	09764035	Filing Dt:	01/16/2001
Publication #:	US20010011526	Pub Dt:	08/09/2001
Title:	PROCESSING CHAMBER FOR ATOMIC LAYER DEPOSITION PROCESSES

Patent #:	6284673	Issue Dt:	09/04/2001	Application #:	09769634	Filing Dt:	01/24/2001
Publication #:	US20010002582	Pub Dt:	06/07/2001
Title:	Method for providing uniform gas delivery to substrates in CVD and PECVD processes

Patent #:	NONE	Issue Dt:		Application #:	09939272	Filing Dt:	08/23/2001
Publication #:	US20010054391	Pub Dt:	12/27/2001
Title:	Method and apparatus for providing uniform gas delivery to substrates in CVD and PECVD processes

Patent #:	6617173	Issue Dt:	09/09/2003	Application #:	09974076	Filing Dt:	10/10/2001
Title:	Method for integration of ferromagnetic films with ultrathin insulating film using atomic layer deposition

Patent #:	NONE	Issue Dt:		Application #:	10052890	Filing Dt:	10/19/2001
Publication #:	US20030190424	Pub Dt:	10/09/2003
Title:	Process for tungsten silicide atomic layer deposition

Patent #:	7183649	Issue Dt:	02/27/2007	Application #:	10122643	Filing Dt:	04/12/2002
Title:	METHODS AND PROCEDURES FOR ENGINEERING OF COMPOSITE CONDUCTIVE FILMS BY ATOMIC LAYER DEPOSITION

Patent #:	6818067	Issue Dt:	11/16/2004	Application #:	10123293	Filing Dt:	04/15/2002
Publication #:	US20020108714	Pub Dt:	08/15/2002
Title:	PROCESSING CHAMBER FOR ATOMIC LAYER DEPOSITION PROCESSES

Patent #:	6905547	Issue Dt:	06/14/2005	Application #:	10175556	Filing Dt:	06/17/2002
Title:	METHOD AND APPARATUS FOR FLEXIBLE ATOMIC LAYER DEPOSITION

Patent #:	6540838	Issue Dt:	04/01/2003	Application #:	10186071	Filing Dt:	06/28/2002
Publication #:	US20020162506	Pub Dt:	11/07/2002
Title:	APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION

Patent #:	6638862	Issue Dt:	10/28/2003	Application #:	10213781	Filing Dt:	08/06/2002
Publication #:	US20020197864	Pub Dt:	12/26/2002
Title:	RADICAL-ASSISTED SEQUENTIAL CVD

Patent #:	6630401	Issue Dt:	10/07/2003	Application #:	10213914	Filing Dt:	08/06/2002
Publication #:	US20020192954	Pub Dt:	12/19/2002
Title:	RADICAL-ASSISTED SEQUENTIAL CVD

Patent #:	6602784	Issue Dt:	08/05/2003	Application #:	10213915	Filing Dt:	08/06/2002
Publication #:	US20020192955	Pub Dt:	12/19/2002
Title:	RADICAL-ASSISTED SEQUENTIAL CVD

Patent #:	6638859	Issue Dt:	10/28/2003	Application #:	10256899	Filing Dt:	09/27/2002
Publication #:	US20030027431	Pub Dt:	02/06/2003
Title:	APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION

Patent #:	6720259	Issue Dt:	04/13/2004	Application #:	10262992	Filing Dt:	10/02/2002
Publication #:	US20040023516	Pub Dt:	02/05/2004
Title:	PASSIVATION METHOD FOR IMPROVED UNIFORMITY AND REPEATABILITY FOR ATOMIC LAYER DEPOSITION AND CHEMICAL VAPOR DEPOSITION

Patent #:	6902624	Issue Dt:	06/07/2005	Application #:	10282609	Filing Dt:	10/29/2002
Publication #:	US20030109094	Pub Dt:	06/12/2003
Title:	MASSIVELY PARALLEL ATOMIC LAYER DEPOSITION/CHEMICAL VAPOR DEPOSITION SYSTEM

Patent #:	6863021	Issue Dt:	03/08/2005	Application #:	10295614	Filing Dt:	11/14/2002
Publication #:	US20040094093	Pub Dt:	05/20/2004
Title:	METHOD AND APPARATUS FOR PROVIDING AND INTEGRATING A GENERAL METAL DELIVERY SOURCE (GMDS) WITH ATOMIC LAYER DEPOSITION (ALD)

Patent #:	6616766	Issue Dt:	09/09/2003	Application #:	10335404	Filing Dt:	12/30/2002
Publication #:	US20030101934	Pub Dt:	06/05/2003
Title:	METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO SUBSTRATES IN CVD AND PECVD PROCESSES

Patent #:	NONE	Issue Dt:		Application #:	10401646	Filing Dt:	03/27/2003
Publication #:	US20030183171	Pub Dt:	10/02/2003
Title:	Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition

Patent #:	7018940	Issue Dt:	03/28/2006	Application #:	10655682	Filing Dt:	09/04/2003
Publication #:	US20040127067	Pub Dt:	07/01/2004
Title:	METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO SUBSTRATES IN CVD AND PECVD PROCESSES

Patent #:	6897119	Issue Dt:	05/24/2005	Application #:	10666694	Filing Dt:	09/18/2003
Title:	APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION

Patent #:	NONE	Issue Dt:		Application #:	10678989	Filing Dt:	10/02/2003
Publication #:	US20040065256	Pub Dt:	04/08/2004
Title:	Systems and methods for improved gas delivery

Patent #:	7015426	Issue Dt:	03/21/2006	Application #:	10777349	Filing Dt:	02/11/2004
Publication #:	US20040211764	Pub Dt:	10/28/2004
Title:	PURGED HEATER-SUSCEPTOR FOR AN ALD/CVD REACTOR

Patent #:	NONE	Issue Dt:		Application #:	10791030	Filing Dt:	03/01/2004
Publication #:	US20050016956	Pub Dt:	01/27/2005
Title:	Methods and apparatus for cycle time improvements for atomic layer deposition

Patent #:	NONE	Issue Dt:		Application #:	10831456	Filing Dt:	04/23/2004
Publication #:	US20050016453	Pub Dt:	01/27/2005
Title:	Collection of unused precursors in ALD

Patent #:	NONE	Issue Dt:		Application #:	11014104	Filing Dt:	12/15/2004
Publication #:	US20050103269	Pub Dt:	05/19/2005
Title:	Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD)

Patent #:	NONE	Issue Dt:		Application #:	11114313	Filing Dt:	04/25/2005
Publication #:	US20050274323	Pub Dt:	12/15/2005
Title:	Massively parallel atomic layer deposition/chemical vapor deposition system

Patent #:	NONE	Issue Dt:		Application #:	11115053	Filing Dt:	04/25/2005
Publication #:	US20050281949	Pub Dt:	12/22/2005
Title:	Massively parallel atomic layer deposition/chemical vapor deposition system

Patent #:	7164203	Issue Dt:	01/16/2007	Application #:	11216750	Filing Dt:	08/30/2005
Title:	METHODS AND PROCEDURES FOR ENGINEERING OF COMPOSITE CONDUCTIVE BY ATOMIC LAYER DEPOSITION

Patent #:	7129580	Issue Dt:	10/31/2006	Application #:	11216751	Filing Dt:	08/30/2005
Title:	METHODS AND PROCEDURES FOR ENGINEERING OF COMPOSITE CONDUCTIVE FILMS BY ATOMIC LAYER DEPOSITION

Patent #:	NONE	Issue Dt:		Application #:	11224767	Filing Dt:	09/12/2005
Publication #:	US20060137609	Pub Dt:	06/29/2006
Title:	Multi-single wafer processing apparatus

Patent #:	NONE	Issue Dt:		Application #:	11351366	Filing Dt:	02/10/2006
Publication #:	US20070042119	Pub Dt:	02/22/2007
Title:	Vaporizer for atomic layer deposition system

Assignor

GENUS, INC.

Exec Dt:

03/31/2006

Assignee

AIXTRON, INC.

1139 KARLSTAD DR

SUNNYVALE, CALIFORNIA 94089

Correspondence name and address
	ASCENDA LAW GROUP
	333 W. SAN CARLOS ST.
	SUITE 200
	SAN JOSE, CA 95110

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