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Total properties:
15
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Patent #:
|
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Issue Dt:
|
05/27/2008
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Application #:
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11035652
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Filing Dt:
|
01/13/2005
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Publication #:
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Pub Dt:
|
07/13/2006
| | | | |
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Title:
|
OVERLAY MEASUREMENT TARGET
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Patent #:
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NONE
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Issue Dt:
|
|
Application #:
|
11177735
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Filing Dt:
|
07/08/2005
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Publication #:
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Pub Dt:
|
01/11/2007
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Title:
|
Apparatus and method for non-contact assessment of a constituent in semiconductor workpieces
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Patent #:
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Issue Dt:
|
08/12/2008
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Application #:
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11212971
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Filing Dt:
|
08/25/2005
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Publication #:
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Pub Dt:
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03/01/2007
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Title:
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APPARATUS AND METHOD FOR NON-CONTACT ASSESSMENT OF A CONSTITUENT IN SEMICONDUCTOR SUBSTRATES
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11288834
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Filing Dt:
|
11/28/2005
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Publication #:
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Pub Dt:
|
06/01/2006
| | | | |
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Title:
|
Method for designing an overlay mark
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Patent #:
|
|
Issue Dt:
|
05/12/2009
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Application #:
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11319677
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Filing Dt:
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12/28/2005
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Publication #:
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Pub Dt:
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07/06/2006
| | | | |
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Title:
|
SCATTEROMETRY METHOD WITH CHARACTERISTIC SIGNATURES MATCHING
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Patent #:
|
NONE
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Issue Dt:
|
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Application #:
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11343500
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Filing Dt:
|
01/30/2006
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Publication #:
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Pub Dt:
|
08/02/2007
| | | | |
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Title:
|
Apparatuses and methods for analyzing semiconductor workpieces
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|
|
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Patent #:
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|
Issue Dt:
|
01/13/2009
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Application #:
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11360031
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Filing Dt:
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02/22/2006
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Publication #:
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Pub Dt:
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09/07/2006
| | | | |
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Title:
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METHODS AND SYSTEMS FOR DETERMINING OVERLAY ERROR BASED ON TARGET IMAGE SYMMETRY
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|
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Patent #:
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NONE
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Issue Dt:
|
|
Application #:
|
11361308
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Filing Dt:
|
02/24/2006
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|
Publication #:
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Pub Dt:
|
12/07/2006
| | | | |
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Title:
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Apparatus and method for enhanced critical dimension scatterometry
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|
|
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Patent #:
|
|
Issue Dt:
|
03/31/2009
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Application #:
|
11361309
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Filing Dt:
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02/24/2006
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Publication #:
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Pub Dt:
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12/14/2006
| | | | |
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Title:
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SCATTEROMETER HAVING A COMPUTER SYSTEM THAT READS DATA FROM SELECTED PIXELS OF THE SENSOR ARRAY
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|
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Patent #:
|
NONE
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Issue Dt:
|
|
Application #:
|
11361670
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Filing Dt:
|
02/24/2006
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Publication #:
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Pub Dt:
|
12/21/2006
| | | | |
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Title:
|
Apparatus and method for enhanced critical dimension scatterometry
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|
|
|
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Patent #:
|
NONE
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Issue Dt:
|
|
Application #:
|
11361677
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Filing Dt:
|
02/24/2006
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|
Publication #:
|
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Pub Dt:
|
12/28/2006
| | | | |
|
Title:
|
Apparatus and method for enhanced critical dimension scatterometry
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/10/2009
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Application #:
|
11361710
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Filing Dt:
|
02/24/2006
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|
Publication #:
|
|
Pub Dt:
|
11/02/2006
| | | | |
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Title:
|
APPARATUS AND METHOD FOR ENHANCED CRITICAL DIMENSION SCATTEROMETRY
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|
|
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Patent #:
|
|
Issue Dt:
|
02/02/2010
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Application #:
|
11372757
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Filing Dt:
|
03/10/2006
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|
Publication #:
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|
Pub Dt:
|
09/13/2007
| | | | |
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Title:
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METHOD FOR EVALUATING MICROSTRUCTURES ON A WORKPIECE BASED ON THE ORIENTATION OF A GRATING ON THE WORKPIECE
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|
|
|
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Patent #:
|
NONE
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Issue Dt:
|
|
Application #:
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11453463
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Filing Dt:
|
06/14/2006
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|
Publication #:
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Pub Dt:
|
12/21/2006
| | | | |
|
Title:
|
Apparatuses and methods for enhanced critical dimension scatterometry
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|
|
|
|
Patent #:
|
NONE
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Issue Dt:
|
|
Application #:
|
11475792
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Filing Dt:
|
06/26/2006
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|
Publication #:
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Pub Dt:
|
01/04/2007
| | | | |
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Title:
|
Apparatuses and methods for detecting defects in semiconductor workpieces
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|
