Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 005048/0308 | |
| Pages: | 6 |
| | Recorded: | 04/18/1989 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
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Total properties:
8
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Patent #:
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Issue Dt:
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10/19/1982
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Application #:
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06218250
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Filing Dt:
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12/19/1980
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Title:
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PROCESS FOR THE PREPARATION OF AZIDOBENZAL COMPOUNDS
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Patent #:
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Issue Dt:
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09/10/1985
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Application #:
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06531781
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Filing Dt:
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09/13/1983
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Title:
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PHOTORESISTS SUITABLE FOR FORMING RELIEF STRUCTURE OF HIGHLY HEAT- RESISTANT POLYMERS
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Patent #:
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Issue Dt:
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09/03/1985
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Application #:
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06561505
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Filing Dt:
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12/15/1983
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Title:
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PROCESS FOR THE DEVELOPMENT OF RELIEF STRUCTURES BASED ON RADIATION- CROSSLINKED POLYMERIC PRECURSORS OF POLYMERS WHICH ARE RESISTANT TO HIGH TEMPERATURE
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Patent #:
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Issue Dt:
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03/18/1986
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Application #:
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06685085
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Filing Dt:
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12/21/1984
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Title:
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DEVELOPER FOR POSITIVE PHOTORESISTS
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Patent #:
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Issue Dt:
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03/10/1987
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Application #:
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06759572
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Filing Dt:
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07/26/1985
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Title:
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PROCESS FOR THE PRODUCTION OF PHOTORESIST RELIEF STRUCTURES HAVING AN OVERHANG CHARACTER USING O-QUINONE DIAZIDE PHOTORESIST WITH OVEREX- POSURE
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Patent #:
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Issue Dt:
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10/20/1987
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Application #:
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06818950
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Filing Dt:
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01/15/1986
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Title:
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POLYAMIDE ESTER PHOTORESIST FORMULATIONS OF ENHANCED SENSITIVITY
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Patent #:
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Issue Dt:
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07/12/1988
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Application #:
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06853102
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Filing Dt:
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04/17/1986
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Title:
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STABILIZED SOLUTIONS OF RADIATION-CROSSLINKABLE POLYMER PRECURSORS OF HIGHLY HEAT-RESISTANT POLYMERS
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Patent #:
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Issue Dt:
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08/09/1988
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Application #:
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06857663
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Filing Dt:
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04/30/1986
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Title:
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NEGATIVELY OPERATING PHOTORESIST COMPOSITION, WITH RADIATION-ABSORBING ADDITIVES
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Assignee
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| A CORP. OF NY |
| ARDSLEY,, NEW YORK |
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Correspondence name and address
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CIBA-GEIGY CORP.
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444 SAW MILL RIVER RD.
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ARDSLEY, NEW YORK 10502
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ARLINGTON, VA 22202
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