Total properties:
10
|
|
Patent #:
|
|
Issue Dt:
|
09/03/1996
|
Application #:
|
08517045
|
Filing Dt:
|
08/18/1995
|
Title:
|
METHOD AND APPARATUS FOR COLD WALL CHEMICAL VAPOR DEPOSITION
|
|
|
Patent #:
|
|
Issue Dt:
|
03/05/2002
|
Application #:
|
08909461
|
Filing Dt:
|
08/11/1997
|
Title:
|
MINI-BATCH PROCESS CHAMBER
|
|
|
Patent #:
|
|
Issue Dt:
|
01/02/2001
|
Application #:
|
09228835
|
Filing Dt:
|
01/12/1999
|
Title:
|
APPARATUS AND METHOD FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) IN A SINGLE WAFER REACTOR
|
|
|
Patent #:
|
|
Issue Dt:
|
11/27/2001
|
Application #:
|
09228840
|
Filing Dt:
|
01/12/1999
|
Publication #:
|
|
Pub Dt:
|
10/18/2001
| | | | |
Title:
|
VERTICAL PLASMA ENHANCED PROCESS APPARATUS & METHOD
|
|
|
Patent #:
|
|
Issue Dt:
|
03/05/2002
|
Application #:
|
09229975
|
Filing Dt:
|
01/14/1999
|
Publication #:
|
|
Pub Dt:
|
12/06/2001
| | | | |
Title:
|
METHOD AND APPARATUS FOR IMPROVED CHEMICAL VAPOR DEPOSITION PROCESSES USING TUNABLE TEMPERATURE CONTROLLED GAS INJECTORS
|
|
|
Patent #:
|
|
Issue Dt:
|
05/22/2001
|
Application #:
|
09396586
|
Filing Dt:
|
09/15/1999
|
Title:
|
HIGH RATE SILICON DIOXIDE DEPOSITION AT LOW PRESSURES
|
|
|
Patent #:
|
|
Issue Dt:
|
09/11/2001
|
Application #:
|
09396588
|
Filing Dt:
|
09/15/1999
|
Title:
|
HIGH RATE SILICON DEPOSITION METHOD AT LOW PRESSURES
|
|
|
Patent #:
|
|
Issue Dt:
|
01/14/2003
|
Application #:
|
09396590
|
Filing Dt:
|
09/15/1999
|
Publication #:
|
|
Pub Dt:
|
11/15/2001
| | | | |
Title:
|
HIGH RATE SILICON NITRIDE DEPOSITION METHOD AT LOW PRESSURES
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
10216079
|
Filing Dt:
|
08/09/2002
|
Publication #:
|
|
Pub Dt:
|
03/13/2003
| | | | |
Title:
|
High rate deposition at low pressures in a small batch reactor
|
|
|
Patent #:
|
|
Issue Dt:
|
07/01/2008
|
Application #:
|
10342151
|
Filing Dt:
|
01/13/2003
|
Publication #:
|
|
Pub Dt:
|
07/17/2003
| | | | |
Title:
|
METHOD AND APPARATUS FOR LAYER BY LAYER DEPOSITION OF THIN FILMS
|
|