Patent Assignment Details
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Reel/Frame: | 053944/0443 | |
| Pages: | 6 |
| | Recorded: | 10/01/2020 | | |
Attorney Dkt #: | 20277-149614-US |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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16965952
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Filing Dt:
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07/29/2020
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Publication #:
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Pub Dt:
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02/11/2021
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Title:
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COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM
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Assignee
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5-2, MARUNOUCHI 2-CHOME, CHIYODA-KU |
TOKYO, JAPAN 100-8324 |
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Correspondence name and address
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FITCH EVEN TABIN & FLANNERY, LLP
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120 SOUTH LASALLE STREET
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SUITE 2100
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CHICAGO, IL 60603-3406
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10/31/2024 08:06 PM
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