Patent Assignment Details
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Reel/Frame: | 004942/0503 | |
| Pages: | 2 |
| | Recorded: | 09/01/1988 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
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Total properties:
1
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Patent #:
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Issue Dt:
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12/13/1988
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Application #:
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07050482
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Filing Dt:
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05/18/1987
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Title:
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PROCESS FOR FORMING MASK PATTERNS OF POSITIVE TYPE RESIST MATERIAL WITH TRIMETHYLSILYNITRILE
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Assignee
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7-12, TORANOMON 1-CHOME, MINATO-KU |
TOKYO, JAPAN |
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Correspondence name and address
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WENDEROTH, LIND & PONACK
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SOUTHERN BUILDING- SUITE 700
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805 FIFTEENTH STREET N.W.
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WASHINGTON, D.C. 20005
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