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Reel/Frame:014559/0512   Pages: 3
Recorded: 10/06/2003
Conveyance: CORRECTIVE ASSIGNMENT
Total properties: 1
1
Patent #:
Issue Dt:
11/09/2004
Application #:
10219168
Filing Dt:
08/15/2002
Publication #:
Pub Dt:
02/19/2004
Title:
USE OF A DUAL-TONE RESIST TO FORM PHOTOMASKS INCLUDING ALIGNMENT MARK PROTECTION, INTERMEDIATE SEMICONDUCTOR DEVICE STRUCTURES AND BULK SEMICONDUCTOR DEVICE SUBSTRATES
Assignor
1
Exec Dt:
09/16/2003
Assignee
1
8000 SOUTH FEDERAL WAY
BOISE, IDAHO 83707-0006
Correspondence name and address
TRASKBRITT
P.O. BOX 2550
SALT LAKE CITY, UT 84110

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