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Total properties:
29
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Patent #:
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Issue Dt:
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03/22/1983
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Application #:
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06275883
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Filing Dt:
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06/22/1981
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Title:
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POSITIVE NOVOLAK PHOTORESIST COMPOSITIONS
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Patent #:
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Issue Dt:
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07/16/1985
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Application #:
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06403935
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Filing Dt:
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08/02/1982
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Title:
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POSITIVE PHOTORESIST COMPOSITION WITH CRESOL-FORMALDEHYDE NOVOLAK RESINS
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Patent #:
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Issue Dt:
|
05/06/1986
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Application #:
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06666743
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Filing Dt:
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10/31/1984
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Title:
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POSITIVE PHOTORESIST WITH CRESOL-FORMALDEHYDE NOVOLAK RESIN AND PHOTOSENSITIVE NAPHTHOQUINONE DIAZIDE
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Patent #:
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Issue Dt:
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10/14/1986
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Application #:
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06721965
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Filing Dt:
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04/11/1985
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Title:
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STRIPPING COMPOSITION AND METHOD OF USING THE SAME
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Patent #:
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Issue Dt:
|
12/02/1986
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Application #:
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06741070
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Filing Dt:
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06/04/1985
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Title:
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POSITIVE-WORKING RESIST O-QUINONE DIAZIDE PHOTORESIST COMPOSITION CONTAINING A DYE AND A TRIHYDROXYBENZOPHENONE COMPOUND
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Patent #:
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Issue Dt:
|
03/17/1987
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Application #:
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06878736
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Filing Dt:
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06/26/1986
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Title:
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METHOD OF FORMING A RESIST PATTERN BY RADIATION EXPOSURE OF POSITIE- WORKING RESIST COATING COMPRISING DYE AND A TRIHYDROXYBENZOPHENONE COMOUND AND SUBSEQUENT AQUEOUS ALKALINE DEVELOPMENT
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Patent #:
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Issue Dt:
|
12/08/1987
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Application #:
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06895628
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Filing Dt:
|
08/11/1986
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Title:
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DEVELOPMENT OF POSITIVE-WORKING PHOTORESIST COMPOSITIONS
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|
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Patent #:
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|
Issue Dt:
|
01/10/1989
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Application #:
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07068397
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Filing Dt:
|
07/01/1987
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Title:
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LIGHT-SENSITIVE 1,2-NAPHTHOQUINONE-2-DIAZIDE-4- SULFONIC ACID MONOESTERS OF CYCLOALKYL SUSTITUTED PHENOL AND THEIR USE IN LIGHT- SENSITIVE MIXTURES
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Patent #:
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|
Issue Dt:
|
06/06/1989
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Application #:
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07124227
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Filing Dt:
|
11/23/1987
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Title:
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THERMALLY STABLE LIGHT-SENSITIVE COMPOSITIONS WITH O-QUINONE DIAZIDE AND PHENOLIC RESIN
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Patent #:
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|
Issue Dt:
|
12/12/1989
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Application #:
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07141128
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Filing Dt:
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01/06/1988
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Title:
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USE OF PARTICULAR MIXTURES OF ETHYL LACTATE AND METHYL ETHYL KETONE TO REMOVE UNDESIRABLE PERIPHERAL MATERIAL (E.G. EDGE BEADS) FROM PHOTORESIST-COATED SUBSTRATES
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Patent #:
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|
Issue Dt:
|
05/09/1989
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Application #:
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07141136
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Filing Dt:
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01/06/1988
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Title:
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AQUEOUS DEVELOPING SOLUTION AND ITS USE IN DEVELOPING POSITIVE-WORKING PHOTORESIST COMPOSITION
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|
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Patent #:
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|
Issue Dt:
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03/26/1991
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Application #:
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07200676
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Filing Dt:
|
05/31/1988
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|
Title:
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LIGHT SENSITIVE COMPOSITION WITH O-QUINONE DIAZIDE AND PHENOLIC NOVOLAK RESIN MADE USING METHYLOL SUBSTITUTED TRIHYDROXY BENZOPHENONE AS REACTANT
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|
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Patent #:
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|
Issue Dt:
|
09/25/1990
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Application #:
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07217512
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Filing Dt:
|
07/11/1988
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|
Title:
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LIGHT-SENSITIVE O-QUINONE DIAZIDE COMPOSITION AND PRODUCT WITH PHENOLIC NOVOLAK PREPARED BY CONDENSATION WITH HALOACETOALDEHYDE
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|
|
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Patent #:
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|
Issue Dt:
|
10/23/1990
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Application #:
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07269521
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Filing Dt:
|
11/10/1988
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|
Title:
|
POSITIVE-WORKING PHOTORESISTS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT
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|
|
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Patent #:
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|
Issue Dt:
|
09/18/1990
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Application #:
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07290009
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Filing Dt:
|
12/27/1988
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|
Title:
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SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES
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|
|
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Patent #:
|
|
Issue Dt:
|
11/13/1990
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Application #:
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07325399
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Filing Dt:
|
03/20/1989
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|
Title:
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THERMALLY STABLE PHENOLIC RESIN COMPOSITIONS WITH ORTHO, ORTHO METHYLENE LINKAGE
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|
|
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Patent #:
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|
Issue Dt:
|
02/26/1991
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Application #:
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07333519
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Filing Dt:
|
04/05/1989
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|
Title:
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PROCESS FOR COATING A PHOTORESIST COMPOSITION ONTO A SUBSTRATE
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|
|
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Patent #:
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|
Issue Dt:
|
09/29/1992
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Application #:
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07386659
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Filing Dt:
|
07/31/1989
|
|
Title:
|
USE OF PARTICULAR MIXTURES OF ETHYL LACTATE AND METHYL ETHYL KETONE TO REMOVE UNDESIRABLE PERIPHERAL MATERIAL (E.G. EDGE BEADS) FROM PHOTORESIST-COATED SUBSTRATES
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|
|
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|
Patent #:
|
|
Issue Dt:
|
12/03/1991
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Application #:
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07408849
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Filing Dt:
|
09/18/1989
|
|
Title:
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PROCESS FOR DEVELOPING SELECTED POSITIVE PHOTORESISTS
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|
|
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Patent #:
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|
Issue Dt:
|
06/01/1993
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Application #:
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07409221
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Filing Dt:
|
09/19/1989
|
|
Title:
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TRIS-(HYDROXYPHENYL) LOWER ALKANE COMPOUNDS AS SENSITIVITY ENHANCERS FOR O-QUINONEDIAZIDE CONTAINING RADIATION - SENSITIVE COMPOSITIONS AND ELEMENTS
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Patent #:
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|
Issue Dt:
|
05/28/1991
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Application #:
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07429298
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Filing Dt:
|
10/30/1989
|
|
Title:
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SELECTED TRIHYDROXYBENZOPHENONE COMPOUNDS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/05/1991
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Application #:
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07533258
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Filing Dt:
|
06/04/1990
|
|
Title:
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POSITIVE-WORKING PHOTORESIST PROCESS EMPLOYING A SELECTED MIXTURE OF ETHYL LACTATE AND ETHYL 3-ETHOXY PROPIONATE AS CASTING SOLVENT DURING PHOTORESIST COATING
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|
|
|
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Patent #:
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|
Issue Dt:
|
02/12/1991
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Application #:
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07534908
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Filing Dt:
|
06/08/1990
|
|
Title:
|
SELECTED TRINUCLEAR NOVOLAK OLIGOMERS AND THEIR USE IN PHOTOACTIVE COMPOUNDS AND RADIATION SENSITIVE MIXTURES
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/12/1991
|
Application #:
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07534909
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Filing Dt:
|
06/08/1990
|
|
Title:
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PROCESS OF DEVELOPING A RADIATION IMAGED PRODUCT WITH TRINUCLEAR NOVOLAK OLIGOMER HAVING O-NAPHTHOQUINONE DIAZIDE SULFONYL GROUP
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/01/1991
|
Application #:
|
07540054
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Filing Dt:
|
06/18/1990
|
|
Title:
|
THERMALLY STABLE PHENOLIC RESIN COMPOSITIONS AND THEIR USE IN LIGHT- SENSITIVE COMPOSITIONS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/19/1991
|
Application #:
|
07540249
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Filing Dt:
|
06/18/1990
|
|
Title:
|
PROCESS OF FORMING RESIST IMAGE IN POSITIVE PHOTORESIST WITH THERMALLY STABLE PHENOLIC RESIN
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/29/1992
|
Application #:
|
07546988
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Filing Dt:
|
07/02/1990
|
|
Title:
|
SELECTED PHOTOACTIVE METHYLOLATED CYCLOHEXANOL COMPOUNDS AND THEIR USE IN RADIATION-SENSITIVE MIXTURES
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/18/1991
|
Application #:
|
07552394
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Filing Dt:
|
09/21/1990
|
|
Title:
|
THERMALLY STABLE LIGHT-SENSITIVE COMPOSITION WITH O-QUINONE DIAZIDE AND PHENOLIC RESIN USED IN A METHOD OF FORMING A POSITIVE PHOTORESIST IMAGE
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/05/1993
|
Application #:
|
07654841
|
Filing Dt:
|
02/13/1991
|
|
Title:
|
SELECTED METHYLOL-SUBSTITUTED TRIHYDROXYBENZOPHENONES AND THEIR USE IN PHENOLIC RESIN COMPOSITIONS
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|
