Patent Assignment Details
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Reel/Frame: | 009078/0617 | |
| Pages: | 3 |
| | Recorded: | 03/30/1998 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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12/28/1999
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Application #:
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09050689
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Filing Dt:
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03/30/1998
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Title:
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A NEW FABRICATION PROCESS EMPLOYING A SINGLE DOPANT IMPLANT FOR FORMATION OF A DRAIN EXTENSION REGION AND A DRAIN REGION OF AN LDD MOSFET USING ENHANCED LATERAL DIFFUSION
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Assignee
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P.O. BOX 3453 |
ONE AMD PLACE |
SUNNYVALE, CALIFORNIA 94088 |
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Correspondence name and address
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RENNER, OTTO, ET AL
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THOMAS G. ESCHWEILER
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1621 EUCLID AVENUE
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NINTEENTH FLOOR
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CLEVELAND, OHIO 44115
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