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Patent Assignment Details
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Reel/Frame:005435/0649   Pages: 5
Recorded: 09/17/1990
Conveyance: CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
Total properties: 4
1
Patent #:
Issue Dt:
03/22/1983
Application #:
06275883
Filing Dt:
06/22/1981
Title:
POSITIVE NOVOLAK PHOTORESIST COMPOSITIONS
2
Patent #:
Issue Dt:
07/16/1985
Application #:
06403935
Filing Dt:
08/02/1982
Title:
POSITIVE PHOTORESIST COMPOSITION WITH CRESOL-FORMALDEHYDE NOVOLAK RESINS
3
Patent #:
Issue Dt:
05/06/1986
Application #:
06666743
Filing Dt:
10/31/1984
Title:
POSITIVE PHOTORESIST WITH CRESOL-FORMALDEHYDE NOVOLAK RESIN AND PHOTOSENSITIVE NAPHTHOQUINONE DIAZIDE
4
Patent #:
Issue Dt:
03/17/1987
Application #:
06878736
Filing Dt:
06/26/1986
Title:
METHOD OF FORMING A RESIST PATTERN BY RADIATION EXPOSURE OF POSITIE- WORKING RESIST COATING COMPRISING DYE AND A TRIHYDROXYBENZOPHENONE COMOUND AND SUBSEQUENT AQUEOUS ALKALINE DEVELOPMENT
Assignor
1
Exec Dt:
02/27/1986
Assignee
1
CHESHIRE, CONNECTICUT 06410
Correspondence name and address
WILLIAM A. SIMONS
OLIN CORPORATION
INTELLECTUAL PROPERTY LAW SECTION
P.O. BOX 586
CHESHIRE, CT 06410-0586

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