Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 046347/0675 | |
| Pages: | 6 |
| | Recorded: | 06/12/2018 | | |
| Attorney Dkt #: | TSMP20173305US00 |
| Conveyance: | CORRECTIVE ASSIGNMENT TO CORRECT THE SPELLING OF THE SECOND INVENTOR'S NAME AND ALL ASSIGNOR'S EXECUTION DATES PREVIOUSLY RECORDED ON REEL 045883 FRAME 0463. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT OF ASSIGNOR'S INTEREST. |
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Total properties:
1
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Patent #:
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Issue Dt:
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07/19/2022
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Application #:
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15983565
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Filing Dt:
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05/18/2018
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Publication #:
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Pub Dt:
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11/21/2019
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Title:
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Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment
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Assignee
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| 8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK |
| HSINCHU, TAIWAN 300-78 |
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Correspondence name and address
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SLATER MATSIL, LLP
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17950 PRESTON RD., SUITE 1000
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DALLAS, TX 75252
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