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Total properties:
37
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Patent #:
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|
Issue Dt:
|
06/19/2001
|
Application #:
|
08418256
|
Filing Dt:
|
04/06/1995
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|
Title:
|
PROCESS AND APPARATUS FOR SPUTTER ETCHING OR SPUTTER COATING
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Patent #:
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|
Issue Dt:
|
04/08/1997
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Application #:
|
08427658
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Filing Dt:
|
04/21/1995
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Title:
|
PROCESS AND APPARATUS FOR THE PRODUCTION OF A METAL OXIDE LAYER
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|
|
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Patent #:
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|
Issue Dt:
|
07/02/2002
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Application #:
|
09170091
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Filing Dt:
|
10/13/1998
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Title:
|
DEVICE FOR THE VACUUM-TIGHT CONNECTING OF TWO BODIES OF DIFFERENT MATERIALS
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Patent #:
|
|
Issue Dt:
|
04/01/2003
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Application #:
|
09243814
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Filing Dt:
|
02/03/1999
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Title:
|
MAGNETRON SPUTTERING SOURCE AND METHOD OF USE THEREOF
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|
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Patent #:
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|
Issue Dt:
|
12/04/2001
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Application #:
|
09338569
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Filing Dt:
|
06/23/1999
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Title:
|
VACUUM TREATMENT EQUIPMENT
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|
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Patent #:
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|
Issue Dt:
|
11/06/2001
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Application #:
|
09469752
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Filing Dt:
|
12/22/1999
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Title:
|
METHOD FOR PRODUCING EPITAXIAL SILICON GERMANIUM LAYERS
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|
|
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Patent #:
|
|
Issue Dt:
|
05/31/2005
|
Application #:
|
09484421
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Filing Dt:
|
01/18/2000
|
|
Title:
|
SPUTTER CHAMBER AS WELL AS VACUUM TRANSPORT CHAMBER AND VACUUM HANDLING APPARATUS WITH SUCH CHAMBERS
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|
|
|
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Patent #:
|
|
Issue Dt:
|
01/28/2003
|
Application #:
|
09581857
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Filing Dt:
|
08/24/2000
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|
Title:
|
HOLDING DEVICE
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/04/2003
|
Application #:
|
09587452
|
Filing Dt:
|
06/05/2000
|
|
Title:
|
VACUUM TREATMENT SYSTEM
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/17/2003
|
Application #:
|
09775527
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Filing Dt:
|
02/01/2001
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|
Publication #:
|
|
Pub Dt:
|
09/20/2001
| | | | |
|
Title:
|
METHOD FOR THE PRODUCTION OF SUBSTRATES, MAGNETRON SOURCE AND SPUTTER-COATING CHAMBER
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/09/2004
|
Application #:
|
09821787
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Filing Dt:
|
03/29/2001
|
|
Publication #:
|
|
Pub Dt:
|
01/03/2002
| | | | |
|
Title:
|
VACUUM TREATMENT CHAMBER AND METHOD FOR TREATING SURFACES
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/02/2003
|
Application #:
|
09886678
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Filing Dt:
|
06/21/2001
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|
Publication #:
|
|
Pub Dt:
|
01/17/2002
| | | | |
|
Title:
|
COATING INSTALLATION FOR DISK-FORM WORKPIECES
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/19/2002
|
Application #:
|
09987605
|
Filing Dt:
|
11/15/2001
|
|
Publication #:
|
|
Pub Dt:
|
03/14/2002
| | | | |
|
Title:
|
VACUUM TREATMENT EQUIPMENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/28/2004
|
Application #:
|
10002996
|
Filing Dt:
|
10/25/2001
|
|
Publication #:
|
|
Pub Dt:
|
01/30/2003
| | | | |
|
Title:
|
METHOD FOR PRODUCING COATED SUBSTRATES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/17/2004
|
Application #:
|
10134915
|
Filing Dt:
|
04/29/2002
|
|
Publication #:
|
|
Pub Dt:
|
11/07/2002
| | | | |
|
Title:
|
MAGNETRON SPUTTER SOURCE WITH MULTIPART TARGET
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/27/2004
|
Application #:
|
10161862
|
Filing Dt:
|
06/04/2002
|
|
Publication #:
|
|
Pub Dt:
|
07/24/2003
| | | | |
|
Title:
|
MAGNETRON SPUTTER SOURCE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/23/2004
|
Application #:
|
10225717
|
Filing Dt:
|
08/22/2002
|
|
Publication #:
|
|
Pub Dt:
|
03/06/2003
| | | | |
|
Title:
|
METHOD FOR CONTROLLING PLASMA DENSITY OR THE DISTRIBUTION THEREOF
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/13/2009
|
Application #:
|
10256718
|
Filing Dt:
|
09/27/2002
|
|
Publication #:
|
|
Pub Dt:
|
04/24/2003
| | | | |
|
Title:
|
PROCEDURE AND DEVICE FOR THE PRODUCTION OF A PLASMA
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/12/2006
|
Application #:
|
10334564
|
Filing Dt:
|
12/31/2002
|
|
Publication #:
|
|
Pub Dt:
|
05/29/2003
| | | | |
|
Title:
|
VACUUM TREATMENT SYSTEM AND METHOD OF MANUFACTURING SAME
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/14/2004
|
Application #:
|
10336514
|
Filing Dt:
|
01/03/2003
|
|
Publication #:
|
|
Pub Dt:
|
07/10/2003
| | | | |
|
Title:
|
ARRANGEMENT FOR ORIENTING THE MAGNETIZATION DIRECTION OF MAGNETIC LAYERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/21/2006
|
Application #:
|
10536204
|
Filing Dt:
|
05/24/2005
|
|
Publication #:
|
|
Pub Dt:
|
03/16/2006
| | | | |
|
Title:
|
METHOD OF PRODUCING A SUBSTRATE WITH A SURFACE TREATED BY A VACUUM TREATMENT PROCESS, USE OF SAID METHOD FOR THE PRODUCTION OF COATED WORKPIECES AND PLASMA TREATMENT CHAMBER
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/15/2010
|
Application #:
|
10542075
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Filing Dt:
|
01/23/2006
|
|
Publication #:
|
|
Pub Dt:
|
05/25/2006
| | | | |
|
Title:
|
INSTALLATION FOR PROCESSING A SUBSTRATE
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/22/2005
|
Application #:
|
10612513
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Filing Dt:
|
07/02/2003
|
|
Publication #:
|
|
Pub Dt:
|
03/18/2004
| | | | |
|
Title:
|
METHOD AND APPARATUS FOR ALD ON A ROTARY SUSCEPTOR
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/01/2005
|
Application #:
|
10703217
|
Filing Dt:
|
11/06/2003
|
|
Publication #:
|
|
Pub Dt:
|
08/05/2004
| | | | |
|
Title:
|
METHOD FOR MANUFACTURING A WORKPIECE USING A MAGNETRON SPUTTER SOURCE
|
|
|
|
|
Patent #:
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|
Issue Dt:
|
05/18/2010
|
Application #:
|
10798331
|
Filing Dt:
|
03/12/2004
|
|
Publication #:
|
|
Pub Dt:
|
09/15/2005
| | | | |
|
Title:
|
METHOD FOR MANUFACTURING SPUTTER-COATED SUBSTRATES, MAGNETRON SOURCE AND SPUTTERING CHAMBER WITH SUCH SOURCE
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|
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|
|
Patent #:
|
|
Issue Dt:
|
12/26/2006
|
Application #:
|
10850741
|
Filing Dt:
|
05/21/2004
|
|
Publication #:
|
|
Pub Dt:
|
10/28/2004
| | | | |
|
Title:
|
ATOMIC LAYER DEPOSITION
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/25/2006
|
Application #:
|
10919273
|
Filing Dt:
|
08/17/2004
|
|
Publication #:
|
|
Pub Dt:
|
01/27/2005
| | | | |
|
Title:
|
SPUTTER CHAMBER AS WELL AS VACUUM TRANSPORT CHAMBER AND VACUUM HANDLING APPARATUS WITH SUCH CHAMBERS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/06/2008
|
Application #:
|
10967383
|
Filing Dt:
|
10/18/2004
|
|
Publication #:
|
|
Pub Dt:
|
03/10/2005
| | | | |
|
Title:
|
METHOD FOR CONTROLLING PLASMA DENSITY OR THE DISTRIBUTION THEREOF
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Patent #:
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|
Issue Dt:
|
09/30/2008
|
Application #:
|
11539218
|
Filing Dt:
|
10/06/2006
|
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Publication #:
|
|
Pub Dt:
|
04/19/2007
| | | | |
|
Title:
|
METHOD FOR THE PRODUCTION OF A SUBSTRATE
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|
Patent #:
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|
Issue Dt:
|
09/24/2013
|
Application #:
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11639034
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Filing Dt:
|
12/14/2006
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Publication #:
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|
Pub Dt:
|
06/28/2007
| | | | |
|
Title:
|
Target arrangement for mounting / dismounting and method of manufacturing
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Patent #:
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Issue Dt:
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04/27/2010
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Application #:
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11815741
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Filing Dt:
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08/07/2007
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Publication #:
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Pub Dt:
|
06/26/2008
| | | | |
|
Title:
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METHOD FOR POSITIONING A WAFER
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Patent #:
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Issue Dt:
|
05/07/2013
|
Application #:
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11954490
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Filing Dt:
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12/12/2007
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Publication #:
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Pub Dt:
|
06/12/2008
| | | | |
|
Title:
|
RF SUBSTRATE BIAS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS)
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Patent #:
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Issue Dt:
|
03/16/2010
|
Application #:
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12053299
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Filing Dt:
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03/21/2008
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Publication #:
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Pub Dt:
|
09/04/2008
| | | | |
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Title:
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METHOD FOR CONTROLLING PLASMA DENSITY OR THE DISTRIBUTION THEREOF
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Patent #:
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Issue Dt:
|
07/02/2013
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Application #:
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12257570
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Filing Dt:
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10/24/2008
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Publication #:
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Pub Dt:
|
04/30/2009
| | | | |
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Title:
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APPLICATION OF HIPIMS TO THROUGH SILICON VIA METALLIZATION IN THREE-DIMENSIONAL WAFER PACKAGING
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Patent #:
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Issue Dt:
|
08/21/2012
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Application #:
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12327960
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Filing Dt:
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12/04/2008
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Publication #:
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Pub Dt:
|
07/09/2009
| | | | |
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Title:
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METHOD OF MAGNETRON SPUTTERING AND A METHOD FOR DETERMINING A POWER MODULATION COMPENSATION FUNCTION FOR A POWER SUPPLY APPLIED TO A MAGNETRON SPUTTERING SOURCE
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Patent #:
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Issue Dt:
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09/18/2012
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Application #:
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12644596
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Filing Dt:
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12/22/2009
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Publication #:
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Pub Dt:
|
06/24/2010
| | | | |
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Title:
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RF SPUTTERING ARRANGEMENT
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Patent #:
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Issue Dt:
|
09/11/2012
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Application #:
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13011109
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Filing Dt:
|
01/21/2011
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|
Publication #:
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|
Pub Dt:
|
07/21/2011
| | | | |
|
Title:
|
PROCESS FOR THE DEPOSITION OF AN ANTI-REFLECTION FILM ON A SUBSTRATE
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|
