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Total properties:
15
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Patent #:
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Issue Dt:
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12/29/2015
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Application #:
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13587598
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Filing Dt:
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08/16/2012
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Publication #:
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Pub Dt:
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02/21/2013
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Title:
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METHOD FOR CORRECTING ELECTRONIC PROXIMITY EFFECTS USING OFF-CENTER SCATTERING FUNCTIONS
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Patent #:
|
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Issue Dt:
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03/17/2015
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Application #:
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13774534
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Filing Dt:
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02/22/2013
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Publication #:
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Pub Dt:
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08/28/2014
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Title:
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FREE FORM FRACTURING METHOD FOR ELECTRONIC OR OPTICAL LITHOGRAPHY
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Patent #:
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Issue Dt:
|
04/03/2018
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Application #:
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13861284
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Filing Dt:
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04/11/2013
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Publication #:
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Pub Dt:
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10/17/2013
| | | | |
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Title:
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METHOD OF CORRECTING ELECTRON PROXIMITY EFFECTS USING VOIGT TYPE SCATTERING FUNCTIONS
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Patent #:
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Issue Dt:
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01/10/2017
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Application #:
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13967740
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Filing Dt:
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08/15/2013
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Publication #:
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Pub Dt:
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02/27/2014
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Title:
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METHOD AND SYSTEM FOR PREPARING A PATTERN TO BE PRINTED ON A PLATE OR MASK BY ELECTRON BEAM LITHOGRAPHY
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Patent #:
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Issue Dt:
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08/30/2016
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Application #:
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14100484
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Filing Dt:
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12/09/2013
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Publication #:
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Pub Dt:
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06/26/2014
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Title:
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METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY MEANS OF ELECTRON-BEAM LITHOGRAPHY AND CORRESPONDING PRINTING DEVICE
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Patent #:
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Issue Dt:
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12/29/2015
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Application #:
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14344671
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Filing Dt:
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04/11/2014
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Publication #:
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Pub Dt:
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11/20/2014
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Title:
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METHOD FOR CORRECTING ELECTRONIC PROXIMITY EFFECTS USING THE DECONVOLUTION OF THE PATTERN TO BE EXPOSED BY MEANS OF A PROBABILISTIC METHOD
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|
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Patent #:
|
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Issue Dt:
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12/18/2018
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Application #:
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14783756
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Filing Dt:
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10/09/2015
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Publication #:
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Pub Dt:
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03/17/2016
| | | | |
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Title:
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LITHOGRAPHY METHOD WITH COMBINED OPTIMIZATION OF THE RADIATED ENERGY AND OF THE GEOMETRY APPLICABLE TO COMPLEX SHAPES
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Patent #:
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Issue Dt:
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02/04/2020
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Application #:
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14915288
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Filing Dt:
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02/29/2016
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Publication #:
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Pub Dt:
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07/21/2016
| | | | |
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Title:
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METHOD FOR THE CORRECTION OF ELECTRON PROXIMITY EFFECTS
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|
|
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Patent #:
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|
Issue Dt:
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02/05/2019
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Application #:
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15286260
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Filing Dt:
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10/05/2016
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Publication #:
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Pub Dt:
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04/06/2017
| | | | |
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Title:
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METHOD OF REDUCING SHOT COUNT IN DIRECT WRITING BY A PARTICLE OR PHOTON BEAM
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|
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Patent #:
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Issue Dt:
|
09/24/2019
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Application #:
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15310709
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Filing Dt:
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11/11/2016
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|
Publication #:
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Pub Dt:
|
05/04/2017
| | | | |
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Title:
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METHOD FOR CALCULATING THE METRICS OF AN IC MANUFACTURING PROCESS
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|
|
|
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Patent #:
|
|
Issue Dt:
|
12/18/2018
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Application #:
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15310731
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Filing Dt:
|
11/11/2016
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|
Publication #:
|
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Pub Dt:
|
03/16/2017
| | | | |
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Title:
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METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCESS BY A DIFFERENTIAL PROCEDURE
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|
|
|
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Patent #:
|
|
Issue Dt:
|
05/21/2019
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Application #:
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15327330
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Filing Dt:
|
01/18/2017
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|
Publication #:
|
|
Pub Dt:
|
06/15/2017
| | | | |
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Title:
|
METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCESS MODEL
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|
|
|
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Patent #:
|
|
Issue Dt:
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01/14/2020
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Application #:
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15534921
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Filing Dt:
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06/09/2017
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Publication #:
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Pub Dt:
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09/20/2018
| | | | |
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Title:
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METHOD OF APPLYING VERTEX BASED CORRECTIONS TO A SEMICONDUCTOR DESIGN
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|
|
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Patent #:
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|
Issue Dt:
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12/31/2019
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Application #:
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15742003
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Filing Dt:
|
01/04/2018
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|
Publication #:
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Pub Dt:
|
07/19/2018
| | | | |
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Title:
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METHOD OF PERFORMING DOSE MODULATION, IN PARTICULAR FOR ELECTRON BEAM LITHOGRAPHY
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|
|
|
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Patent #:
|
|
Issue Dt:
|
03/03/2020
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Application #:
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15763829
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Filing Dt:
|
03/27/2018
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|
Publication #:
|
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Pub Dt:
|
07/19/2018
| | | | |
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Title:
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METHOD FOR DETERMINING THE DOSE CORRECTIONS TO BE APPLIED TO AN IC MANUFACTURING PROCESS BY A MATCHING PROCEDURE
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