Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 055065/0735 | |
| Pages: | 5 |
| | Recorded: | 01/28/2021 | | |
| Attorney Dkt #: | 095714-1177 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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07/18/2023
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Application #:
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17150403
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Filing Dt:
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01/15/2021
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Publication #:
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Pub Dt:
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09/30/2021
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Title:
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PHOTORESIST LAYER SURFACE TREATMENT, CAP LAYER, AND METHOD OF FORMING PHOTORESIST PATTERN
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Assignee
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| NO. 8, LI-HSIN RD. 6, SCIENCE BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN 300 |
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Correspondence name and address
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MCDERMOTT WILL & EMERY LLP
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THE MCDERMOTT BUILDING
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500 NORTH CAPITOL STREET
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WASHINGTON, DC 20001
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