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Patent Assignment Details

NOTE:Results display only for issued patents and published applications. For pending or abandoned applications please consult USPTO staff.

Reel/Frame:	015027/0787			Pages:	7
		Recorded:	08/25/2004
Conveyance:	ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).

Total properties: 11

Patent #:	5551985	Issue Dt:	09/03/1996	Application #:	08517045	Filing Dt:	08/18/1995
Title:	METHOD AND APPARATUS FOR COLD WALL CHEMICAL VAPOR DEPOSITION

Patent #:	6352593	Issue Dt:	03/05/2002	Application #:	08909461	Filing Dt:	08/11/1997
Title:	MINI-BATCH PROCESS CHAMBER

Patent #:	6167837	Issue Dt:	01/02/2001	Application #:	09228835	Filing Dt:	01/12/1999
Title:	APPARATUS AND METHOD FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) IN A SINGLE WAFER REACTOR

Patent #:	6321680	Issue Dt:	11/27/2001	Application #:	09228840	Filing Dt:	01/12/1999
Publication #:	US20010029892	Pub Dt:	10/18/2001
Title:	VERTICAL PLASMA ENHANCED PROCESS APPARATUS & METHOD

Patent #:	6352594	Issue Dt:	03/05/2002	Application #:	09229975	Filing Dt:	01/14/1999
Publication #:	US20010047764	Pub Dt:	12/06/2001
Title:	METHOD AND APPARATUS FOR IMPROVED CHEMICAL VAPOR DEPOSITION PROCESSES USING TUNABLE TEMPERATURE CONTROLLED GAS INJECTORS

Patent #:	6235652	Issue Dt:	05/22/2001	Application #:	09396586	Filing Dt:	09/15/1999
Title:	HIGH RATE SILICON DIOXIDE DEPOSITION AT LOW PRESSURES

Patent #:	6287635	Issue Dt:	09/11/2001	Application #:	09396588	Filing Dt:	09/15/1999
Title:	HIGH RATE SILICON DEPOSITION METHOD AT LOW PRESSURES

Patent #:	6506691	Issue Dt:	01/14/2003	Application #:	09396590	Filing Dt:	09/15/1999
Publication #:	US20010041218	Pub Dt:	11/15/2001
Title:	HIGH RATE SILICON NITRIDE DEPOSITION METHOD AT LOW PRESSURES

Patent #:	6780464	Issue Dt:	08/24/2004	Application #:	09954705	Filing Dt:	09/10/2001
Publication #:	US20020028290	Pub Dt:	03/07/2002
Title:	THERMAL GRADIENT ENHANCED CVD DEPOSITION AT LOW PRESSURE

Patent #:	NONE	Issue Dt:		Application #:	10216079	Filing Dt:	08/09/2002
Publication #:	US20030049372	Pub Dt:	03/13/2003
Title:	High rate deposition at low pressures in a small batch reactor

Patent #:	7393561	Issue Dt:	07/01/2008	Application #:	10342151	Filing Dt:	01/13/2003
Publication #:	US20030134038	Pub Dt:	07/17/2003
Title:	METHOD AND APPARATUS FOR LAYER BY LAYER DEPOSITION OF THIN FILMS

Assignor

Exec Dt:

08/23/2004

Assignee

3050 BOWERS AVENUE, M/S 0105

PO BOX 58039

SANTA CLARA, CALIFORNIA 95054

Correspondence name and address
	JENNIFER GUTTERMAN
	767 5TH AVENUE
	NEW YORK, NY 10153

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