skip navigationU S P T O SealUnited States Patent and Trademark Office AOTW logo
Home|Site Index|Search|Guides|Contacts|eBusiness|eBiz alerts|News|Help
Assignments on the Web > Patent Query
Patent Assignment Details
NOTE:Results display only for issued patents and published applications. For pending or abandoned applications please consult USPTO staff.

Reel/Frame:028222/0934   Pages: 6
Recorded: 04/18/2012
Attorney Dkt #:22524-01000
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 13
1
Patent #:
Issue Dt:
04/13/2010
Application #:
11245691
Filing Dt:
10/06/2005
Publication #:
Pub Dt:
01/11/2007
Title:
SYSTEMS, MASKS, AND METHODS FOR MANUFACTURABLE MASKS USING A FUNCTIONAL REPRESENTATION OF POLYGON PATTERN
2
Patent #:
Issue Dt:
08/31/2010
Application #:
11538290
Filing Dt:
10/03/2006
Publication #:
Pub Dt:
08/09/2007
Title:
LITHOGRAPHY VERIFICATION USING GUARD BANDS
3
Patent #:
Issue Dt:
04/05/2011
Application #:
11538420
Filing Dt:
10/03/2006
Publication #:
Pub Dt:
08/09/2007
Title:
MASK-PATTERN DETERMINATION USING TOPOLOGY TYPES
4
Patent #:
Issue Dt:
09/07/2010
Application #:
11538782
Filing Dt:
10/04/2006
Publication #:
Pub Dt:
08/23/2007
Title:
MASK-PATTERNS INCLUDING INTENTIONAL BREAKS
5
Patent #:
Issue Dt:
04/20/2010
Application #:
11539601
Filing Dt:
10/06/2006
Publication #:
Pub Dt:
08/09/2007
Title:
SYSTEM, MASKS, AND METHODS FOR PHOTOMASKS OPTIMIZED WITH APPROXIMATE AND ACCURATE MERIT FUNCTIONS
6
Patent #:
Issue Dt:
12/20/2011
Application #:
12423686
Filing Dt:
04/14/2009
Publication #:
Pub Dt:
12/24/2009
Title:
MASK PATTERNS FOR USE IN MULTIPLE-EXPOSURE LITHOGRAPHY
7
Patent #:
Issue Dt:
12/20/2011
Application #:
12423693
Filing Dt:
04/14/2009
Publication #:
Pub Dt:
11/26/2009
Title:
TECHNIQUE FOR CORRECTING HOTSPOTS IN MASK PATTERNS AND WRITE PATTERNS
8
Patent #:
Issue Dt:
03/25/2014
Application #:
12507336
Filing Dt:
07/22/2009
Publication #:
Pub Dt:
01/27/2011
Title:
DETERMINING SOURCE PATTERNS FOR USE IN PHOTOLITHOGRAPHY
9
Patent #:
Issue Dt:
07/30/2013
Application #:
12715351
Filing Dt:
03/01/2010
Publication #:
Pub Dt:
09/01/2011
Title:
Full-Field Mask Error Enhancement Function
10
Patent #:
Issue Dt:
10/09/2012
Application #:
12724362
Filing Dt:
03/15/2010
Publication #:
Pub Dt:
09/15/2011
Title:
DETERMINING CALIBRATION PARAMETERS FOR A LITHOGRAPHIC PROCESS
11
Patent #:
NONE
Issue Dt:
Application #:
13297016
Filing Dt:
11/15/2011
Publication #:
Pub Dt:
05/16/2013
Title:
OPC Checking and Classification
12
Patent #:
Issue Dt:
06/25/2013
Application #:
13305650
Filing Dt:
11/28/2011
Publication #:
Pub Dt:
05/30/2013
Title:
LITHOGRAPHICALLY ENHANCED EDGE DETERMINATION
13
Patent #:
Issue Dt:
08/13/2013
Application #:
13313957
Filing Dt:
12/07/2011
Publication #:
Pub Dt:
06/13/2013
Title:
SPATIAL MAP OF MASK-PATTERN DEFECTS
Assignor
1
Exec Dt:
04/17/2012
Assignee
1
700 EAST MIDDLEFIELD ROA
MOUNTIAN VIEW, CALIFORNIA 94043
Correspondence name and address
ROBIN W. REASONER
801 CALIFORNIA STREET
MOUNTAIN VIEW, CALIFORNIA 94041

Search Results as of: 05/31/2024 09:40 AM
If you have any comments or questions concerning the data displayed, contact PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified: August 25, 2017 v.2.6
| .HOME | INDEX| SEARCH | eBUSINESS | CONTACT US | PRIVACY STATEMENT