Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
| Reel/Frame: | 023436/0950 | |
| Pages: | 3 |
| | Recorded: | 10/20/2009 | | |
| Attorney Dkt #: | JCLA31663 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
|
|
Total properties:
1
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
12589282
|
Filing Dt:
|
10/20/2009
|
|
Publication #:
|
|
Pub Dt:
|
03/03/2011
| | | | |
|
Title:
|
Plasma apparatus and method of fabricating nano-crystalline silicon thin film
|
|
|
Assignee
|
|
|
|
|
| 1127, HEPING RD., BADE CITY |
| TAOYUAN, TAIWAN |
|
|
Correspondence name and address
|
| |
J. C. PATENTS
|
| |
4, VENTURE SUITE 250
|
| |
IRVINE, CA. 92618
|
Search Results as of:
05/23/2024 04:11 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|
