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Total properties:
23
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|
|
|
Patent #:
|
|
Issue Dt:
|
03/09/1999
|
Application #:
|
08920708
|
Filing Dt:
|
08/29/1997
|
|
Title:
|
VERTICALLY-STACKED PROCESS REACTOR AND CLUSTER TOOL SYSTEM FOR ATOMIC LAYER DEPOSITION
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/27/2001
|
Application #:
|
09350417
|
Filing Dt:
|
07/08/1999
|
|
Title:
|
METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO SUBSTRATES IN CVD AND PECVD PROCESSES
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/30/2001
|
Application #:
|
09381208
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Filing Dt:
|
11/18/1999
|
|
Title:
|
CVD REACTOR AND APPLICATION THEREOF
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/07/2003
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Application #:
|
09470279
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Filing Dt:
|
12/22/1999
|
|
Title:
|
APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/17/2002
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Application #:
|
09727978
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Filing Dt:
|
11/29/2000
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|
Publication #:
|
|
Pub Dt:
|
05/10/2001
| | | | |
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Title:
|
APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION
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|
|
|
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Patent #:
|
|
Issue Dt:
|
02/27/2007
|
Application #:
|
10122643
|
Filing Dt:
|
04/12/2002
|
|
Title:
|
METHODS AND PROCEDURES FOR ENGINEERING OF COMPOSITE CONDUCTIVE FILMS BY ATOMIC LAYER DEPOSITION
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/14/2005
|
Application #:
|
10175556
|
Filing Dt:
|
06/17/2002
|
|
Title:
|
METHOD AND APPARATUS FOR FLEXIBLE ATOMIC LAYER DEPOSITION
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/01/2003
|
Application #:
|
10186071
|
Filing Dt:
|
06/28/2002
|
|
Publication #:
|
|
Pub Dt:
|
11/07/2002
| | | | |
|
Title:
|
APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/28/2003
|
Application #:
|
10256899
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Filing Dt:
|
09/27/2002
|
|
Publication #:
|
|
Pub Dt:
|
02/06/2003
| | | | |
|
Title:
|
APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/07/2005
|
Application #:
|
10282609
|
Filing Dt:
|
10/29/2002
|
|
Publication #:
|
|
Pub Dt:
|
06/12/2003
| | | | |
|
Title:
|
MASSIVELY PARALLEL ATOMIC LAYER DEPOSITION/CHEMICAL VAPOR DEPOSITION SYSTEM
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/08/2005
|
Application #:
|
10295614
|
Filing Dt:
|
11/14/2002
|
|
Publication #:
|
|
Pub Dt:
|
05/20/2004
| | | | |
|
Title:
|
METHOD AND APPARATUS FOR PROVIDING AND INTEGRATING A GENERAL METAL DELIVERY SOURCE (GMDS) WITH ATOMIC LAYER DEPOSITION (ALD)
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/28/2006
|
Application #:
|
10655682
|
Filing Dt:
|
09/04/2003
|
|
Publication #:
|
|
Pub Dt:
|
07/01/2004
| | | | |
|
Title:
|
METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO SUBSTRATES IN CVD AND PECVD PROCESSES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/24/2005
|
Application #:
|
10666694
|
Filing Dt:
|
09/18/2003
|
|
Title:
|
APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/21/2006
|
Application #:
|
10777349
|
Filing Dt:
|
02/11/2004
|
|
Publication #:
|
|
Pub Dt:
|
10/28/2004
| | | | |
|
Title:
|
PURGED HEATER-SUSCEPTOR FOR AN ALD/CVD REACTOR
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/19/2011
|
Application #:
|
10791334
|
Filing Dt:
|
03/01/2004
|
|
Publication #:
|
|
Pub Dt:
|
06/05/2008
| | | | |
|
Title:
|
TRANSIENT ENHANCED ATOMIC LAYER DEPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/16/2007
|
Application #:
|
11216750
|
Filing Dt:
|
08/30/2005
|
|
Title:
|
METHODS AND PROCEDURES FOR ENGINEERING OF COMPOSITE CONDUCTIVE BY ATOMIC LAYER DEPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/12/2008
|
Application #:
|
11377759
|
Filing Dt:
|
03/16/2006
|
|
Publication #:
|
|
Pub Dt:
|
11/09/2006
| | | | |
|
Title:
|
PROCESS AND APPARATUS FOR DEPOSITING SINGLE-COMPONENT OR MULTI-COMPONENT LAYERS AND LAYER SEQUENCES USING DISCONTINUOUS INJECTION OF LIQUID AND DISSOLVED STARTING SUBSTANCES VIA A MULTI-CHANNEL INJECTION UNIT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/14/2012
|
Application #:
|
11763231
|
Filing Dt:
|
06/14/2007
|
|
Publication #:
|
|
Pub Dt:
|
12/20/2007
| | | | |
|
Title:
|
METHOD FOR SELF-LIMITING DEPOSITION OF ONE OR MORE MONOLAYERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/08/2013
|
Application #:
|
11815091
|
Filing Dt:
|
02/24/2012
|
|
Publication #:
|
|
Pub Dt:
|
01/15/2009
| | | | |
|
Title:
|
GAS DISTRIBUTOR WITH PRE-CHAMBERS ARRANGED IN PLANES
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/09/2014
|
Application #:
|
14038669
|
Filing Dt:
|
09/26/2013
|
|
Publication #:
|
|
Pub Dt:
|
01/30/2014
| | | | |
|
Title:
|
APPARATUS AND METHOD FOR HIGH-THROUGHPUT CHEMICAL VAPOR DEPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/13/2015
|
Application #:
|
14391294
|
Filing Dt:
|
10/08/2014
|
|
Publication #:
|
|
Pub Dt:
|
02/19/2015
| | | | |
|
Title:
|
METHOD FOR FORMING TISIN THIN FILM LAYER BY USING ATOMIC LAYER DEPOSITION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/07/2017
|
Application #:
|
14553436
|
Filing Dt:
|
11/25/2014
|
|
Publication #:
|
|
Pub Dt:
|
06/04/2015
| | | | |
|
Title:
|
Method and Apparatus for Fabricating Dielectric Structures
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15348883
|
Filing Dt:
|
11/10/2016
|
|
Publication #:
|
|
Pub Dt:
|
05/10/2018
| | | | |
|
Title:
|
DEVICE AND METHOD TO CONTROL THE UNIFORMITY OF A GAS FLOW IN A CVD OR AN ALD REACTOR OR OF A LAYER GROWN THEREIN
|
|
