Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/01/2019
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Application #:
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15824227
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Filing Dt:
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11/28/2017
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Publication #:
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Pub Dt:
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03/22/2018
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Inventors:
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Kazuhiro HAMAMOTO, Toshihiko ORIHARA, Hirofumi KOZAKAI, Youichi USUI, Tsutomu SHOKI et al
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Title:
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MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TRANSMISSIVE MASK BLANK, REFLECTIVE MASK BLANK, TRANSMISSIVE MASK, REFLECTIVE MASK, AND SEMICONDUCTOR DEVICE FABRICATION METHOD
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 7-5, NAKA-OCHIAI 2-CHOME, SHINJUKU-KU |
| TOKYO, JAPAN |
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| KILPATRICK TOWNSEND & STOCKTON LLP |
| 1100 PEACHTREE STREET |
| SUITE 2800 |
| ATLANTA, GA 30309 |
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