Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/15/2019
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Application #:
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15011813
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Filing Dt:
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02/01/2016
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Publication #:
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Pub Dt:
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05/26/2016
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Inventors:
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Hiroo TAKIZAWA, Toru FUJIMORI, Wataru NIHASHI, Shuji HIRANO, Natsumi YOKOKAWA
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Title:
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PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 26-30, NISHIAZABU 2-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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| SUGHRUE-265550 |
| 2100 PENNSYLVANIA AVE. NW |
| SUITE 800 |
| WASHINGTON, DC 20037-3213 |
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