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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
11/12/2019
Application #:
14660531
Filing Dt:
03/17/2015
Publication #:
Pub Dt:
09/22/2016
Inventors:
Kenneth S. Collins, Kartik Ramaswamy, Yang Yang, James D. Carducci, Shahid Rauf et al
Title:
ION-ION PLASMA ATOMIC LAYER ETCH PROCESS AND REACTOR
Assignment: 1
Reel/Frame:
035360/0403Recorded: 04/08/2015Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
03/31/2015
Exec Dt:
03/26/2015
Exec Dt:
03/27/2015
Exec Dt:
03/27/2015
Exec Dt:
03/29/2015
Exec Dt:
03/27/2015
Assignee:
3050 BOWERS AVENUE
SANTA CLARA, CALIFORNIA 95054
Correspondent:
ROBERT M. WALLACE
2112 EASTMAN AVENUE, SUITE 102
LAW OFFICE OF ROBERT M. WALLACE
VENTURA, CA 93003

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