Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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04/21/2020
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Application #:
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16145382
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Filing Dt:
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09/28/2018
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Publication #:
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Pub Dt:
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04/02/2020
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Inventors:
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Chien-Shun Liao, Huai-Tei Yang, Chun-I Wu, Wang Chun-Chieh, Yueh-Ching Pai
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Title:
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High-K Metal Gate Process and Device
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 8, LI-HSIN RD. 6 |
| HSINCHU SCIENCE PARK |
| HSINCHU, TAIWAN 300-78 |
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| SLATER MATSIL, LLP/TSMC |
| 17950 PRESTON ROAD, SUITE 1000 |
| DALLAS, TX 75252 |
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Assignment:
2
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CORRECTIVE ASSIGNMENT TO CORRECT THE THIRD ASSIGNOR'S NAME PREVIOUSLY RECORDED AT REEL: 047434 FRAME: 0465. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT.
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| 8, LI-HSIN RD. 6 |
| HSINCHU SCIENCE PARK |
| HSINCHU, TAIWAN 300-78 |
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| SLATER MATSIL, LLP/TSMC |
| 17950 PRESTON ROAD, SUITE 1000 |
| DALLAS, TX 75252 |
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05/15/2024 01:10 PM
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