Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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06/09/2020
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Application #:
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15911488
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Filing Dt:
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03/05/2018
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Publication #:
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Pub Dt:
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07/12/2018
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Inventors:
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Kuo-Cheng Chiang, Chao-Hsiung Wang, Ting-Hung Hsu, Chi-Wen Liu
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Title:
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Fin Spacer Protected Source and Drain Regions in FinFETs
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 8, LI-HSIN RD. 6 |
| HSINCHU SCIENCE PARK |
| HSINCHU, TAIWAN 300-78 |
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| SLATER MATSIL LLP/TSMC |
| 17950 PRESTON ROAD, SUITE 1000 |
| DALLAS, TX 75252 |
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