Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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12/01/2020
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Application #:
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16566363
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Filing Dt:
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09/10/2019
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Publication #:
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Pub Dt:
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04/16/2020
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Inventors:
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Kazuyuki HINO, Hiromitsu MASHITA, Masahiro MIYAIRI, Hiroshi YOSHIMURA, Taiga UNO et al
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Title:
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MASK PATTERN CORRECTION SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD UTILIZING SAID CORRECTION SYSTEM
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Assignment:
1
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CHANGE OF NAME AND ADDRESS
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| 1-21, SHIBAURA 3-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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| CPA GLOBAL LIMITED |
| LIBERATION HOUSE |
| CASTLE ST |
| ST HELIER, JE1 1BL JERSEY |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-1, SHIBAURA 1-CHOME |
| MINATO-KU TOKYO, JAPAN 105-0023 |
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| BLAKE LIEBERMAN |
| 630 9TH AVENUE |
| 10TH FL |
| NEW YORK, NY 10036 |
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