Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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09/28/2021
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Application #:
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16586021
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Filing Dt:
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09/27/2019
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Publication #:
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Pub Dt:
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01/23/2020
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Inventors:
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Satoshi INOUE, Tatsuya SHIMODA, Kazuhiro FUKADA, Kiyoshi NISHIOKA, Nobutaka FUJIMOTO et al
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Title:
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METHOD OF PRODUCING ETCHING MASK, ETCHING MASK PRECURSOR, AND OXIDE LAYER, AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-1 ASAHIDAI, NOMI-SHI |
| ISHIKAWA, JAPAN 923-1292 |
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| 346-1, MIYANISHI, HARIMA-CHO |
| HYOGO, JAPAN 675-0145 |
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| BUCKLEY, MASCHOFF & TALWALKAR LLC |
| 50 LOCUST AVENUE |
| NEW CANAAN, CT 06840 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 1-1 ASAHIDAI, NOMI-SHI |
| ISHIKAWA, JAPAN 923-1292 |
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| 346-1, MIYANISHI, HARIMA-CHO, KAKO-GUN |
| HYOGO, JAPAN 675-0145 |
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| BUCKLEY, MASCHOFF & TALWALKAR LLC |
| 50 LOCUST AVENUE |
| NEW CANAAN, CT 06840 |
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