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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
11189497
Issue Dt:
11/30/2021
Application #:
16415981
Filing Dt:
05/17/2019
Publication #:
20200365413
Pub Dt:
11/19/2020
Inventors:
Po-Chin Nien, Gang Huang, William Weilun Hong
Title:
CHEMICAL MECHANICAL PLANARIZATION USING NANO-ABRASIVE SLURRY
Assignment: 1
Reel/Frame:
049651/0850Recorded: 07/02/2019Pages: 2
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
NIEN, PO-CHIN
Exec Dt:
05/03/2019
HUANG, GANG
Exec Dt:
05/03/2019
HONG, WILLIAM WEILUN
Exec Dt:
05/03/2019
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8, LI-HSIN RD. 6 HSINCHU SCIENCE PARK
HSINCHU, CHINA 300-78
Correspondent:
SLATER MATSIL, LLP/TSMC
17950 PRESTON ROAD, SUITE 1000
DALLAS, TX 75252
Assignment: 2
Reel/Frame:
058293/0307Recorded: 12/01/2021Pages: 4
Conveyance:
CORRECTIVE ASSIGNMENT TO CORRECT THE THE ERROR MADE TO THE ASSIGNEE'S COUNTRY PREVIOUSLY RECORDED AT REEL: 049651 FRAME: 0850. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT.
Assignors:
NIEN, PO-CHIN
Exec Dt:
05/03/2019
HUANG, GANG
Exec Dt:
05/03/2019
HONG, WILLIAM WEILUN
Exec Dt:
05/03/2019
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK
HSINCHU, TAIWAN 300-78
Correspondent:
SLATER MATSIL, LLP
17950 PRESTON ROAD, SUITE 1000
DALLAS, TX 75252

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