Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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07/11/2023
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Application #:
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17235220
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Filing Dt:
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04/20/2021
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Publication #:
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Pub Dt:
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10/21/2021
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Inventors:
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Hirotomo KAWAHARA, Hiroyoshi TANABE, Toshiyuki UNO, Hiroshi HANEKAWA, Daijiro AKAGI
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Title:
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REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8405 |
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| MICHAEL D. KAMINSKI |
| FOLEY & LARDNER LLP |
| 3000 K STREET, N.W., SUITE 600 |
| WASHINGTON, DC 20007 |
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