Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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04/09/2024
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Application #:
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18198881
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Filing Dt:
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05/18/2023
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Publication #:
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Pub Dt:
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10/12/2023
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Inventors:
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Hirotomo KAWAHARA, Daijiro AKAGI, Hiroaki IWAOKA, Toshiyuki UNO, Michinori SUEHARA et al
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Title:
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REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAME
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 5-1, MARUNOUCHI 1-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8405 |
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| OBLON, MCCLELLAND, MAIER & NEUSTADT, L.L |
| 1940 DUKE STREET |
| ALEXANDRIA, VA 22314 |
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05/03/2024 05:59 PM
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