Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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10/07/1986
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Application #:
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06742100
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Filing Dt:
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06/06/1985
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Inventors:
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HIDEO NAMATSU, AKIRA YOSHIKAWA
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Title:
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INTERMEDIATE LAYER MATERIAL OF THREE-LAYER RESIST SYSTEM AND METHOD OF FORMING RESIST PATTERN
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST.
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| 1-6, 1-CHOME, UCHISAIWAI-CHO, CHIYODA-KU |
| A CORP. OF JAPAN |
| TOKYO, JAPAN |
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| FRISHAUF, HOLTZ, GOODMAN & WOODWARD |
| 261 MADIDON AVENUE |
| NEW YORK, NY 10016 |
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Assignment:
2
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| SHINJUKU-KU |
| 19-2 NISHI-SHINJUKU 3-CHOME |
| TOYKO 163-19, JAPAN |
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| FRISHAUF, HOLTZ, GOODMAN ET AL. |
| RICHARD S. BARTH |
| 767 THIRD AVENUE, 25TH FLOOR |
| NEW YORK, NY 10017-2023 |
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