Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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10/27/1987
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Application #:
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06733505
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Filing Dt:
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05/10/1985
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Inventors:
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AKINOBU TANAKA, MASAO MORITA, SABURO IMAMURA, TOSHIAKI TAMAMURA, OSAMU KOGURE
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Title:
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PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR FORMING PHOTO-RESIST PATTERN USING THE SAME
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Assignment:
1
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| 19-2, NISHI-SHINJUKU 3-CHOME, SHINJUKU-KU |
| TOKYO 163-19, JAPAN |
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| FRISHAUF, HOLTZ, GOODMAN, |
| LANGER & CHICK, P.C. |
| RICHARD S. BARTH |
| 767 THIRD AVENUE, 25TH FLOOR |
| NEW YORK, NY 10017-2023 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST.
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| FRISHAUF, HOLTZ, GOODMAN & WOODWARD |
| 261 MADISON AVE., |
| NEW YORK, NY 10016 |
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