Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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12/26/1989
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Application #:
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07159292
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Filing Dt:
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02/23/1988
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Inventors:
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KATSUAKI KAIFU, MAKI KOSUGE, YOSHIO YAMASHITA, TAKATERU ASANO, KENJI KOBAYASHI
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Title:
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PROCESS FOR FORMING PHOTORESIST PATTERN USING CONTRAST ENHANCEMENT LAYER WIT ABIETIC ACID
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST.
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| 7-12, TORANOMON 1-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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| 9-17, AZABUDAI 1-CHOME, MINATO-KU |
| TOKYO 106, JAPAN |
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| WENDEROTH, LIND & PONACK |
| SUITE 1100 |
| 1750 PENNSYLVANIA AVE., N.W. |
| WASHINGTON, D.C. 20006 |
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