Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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01/19/1993
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Application #:
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07761454
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Filing Dt:
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09/18/1991
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Inventors:
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YOSHIHISA OAE, KIICHI SAKAMOTO, HIROSHI YASUDA
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Title:
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ELECTRON BEAM EXPOSURE SYSTEM HAVING THE CAPABILITY OF CHECKING THE PATTERN OF AN ELECTRON MASK USED FOR SHAPING AN ELECTRON BEAM
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST.
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| 1015, KAMIKODANAKA, NAKAHARA-KU |
| KAWASAKI-SHI |
| KANAGAWA, 211, JAPAN |
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| STAAS & HALSEY |
| 1825 K STREET, N.W. |
| WASHINGTON, D.C. 20006 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 7-1, NISHI-SHINJUKU 2-CHOME |
| SHINJUKU-KU, TOKYO 163-0722, JAPAN |
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| STAAS & HALSEY LLP |
| ATTENTION: H. J. STAAS |
| 1201 NEW YORK AVE., N.W., 7TH FLOOR |
| WASHINGTON, D.C. 20005 |
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Assignment:
3
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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| 2-10-23 SHIN-YOKOHAMA |
| KOHOKU-KU, YOKOHAMA-SHI |
| KANAGAWA 222-0033, JAPAN |
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| STAAS & HALSEY LLP |
| ATTENTION: PAUL I. KRAVETZ |
| 1201 NEW YORK AVE., N.W., 7TH FLOOR |
| WASHINGTON, D.C. 20005 |
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