Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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09/21/1993
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Application #:
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07797987
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Filing Dt:
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11/26/1991
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Inventors:
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AKIHISA MATSUDA, SATOSHI MASHIMA, MAKOTO TODA, KOUJI FUJITA
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Title:
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METHOD OF FORMING THIN FILM OF AMORPHOUS SILICON BY PLASMA CVD
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Assignment:
1
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ASSIGNMENT OF 1/2 OF ASSIGNORS INTEREST
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NO. 5253, OAZA OKIUBE, UBE CITY |
YAMAGUCHI PREF., JAPAN |
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NO. 1-3-1, KASUMIGASEKI |
CHIYODA-KU, TOKYO, JAPAN |
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FLEIT, JACOBSON, COHN, PRICE ET AL |
MARTIN FLEIT |
THE JENIFER BUILDING |
400 SEVENTH STREET, N.W. |
WASHINGTON, D.C. 20004 |
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