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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
09/21/1993
Application #:
07797987
Filing Dt:
11/26/1991
Inventors:
AKIHISA MATSUDA, SATOSHI MASHIMA, MAKOTO TODA, KOUJI FUJITA
Title:
METHOD OF FORMING THIN FILM OF AMORPHOUS SILICON BY PLASMA CVD
Assignment: 1
Reel/Frame:
006032/0246Recorded: 02/27/1992Pages: 2
Conveyance:
ASSIGNMENT OF 1/2 OF ASSIGNORS INTEREST
Assignors:
Exec Dt:
01/31/1992
Exec Dt:
01/31/1992
Exec Dt:
01/31/1992
Exec Dt:
01/31/1992
Assignees:
NO. 5253, OAZA OKIUBE, UBE CITY
YAMAGUCHI PREF., JAPAN
NO. 1-3-1, KASUMIGASEKI
CHIYODA-KU, TOKYO, JAPAN
Correspondent:
FLEIT, JACOBSON, COHN, PRICE ET AL
MARTIN FLEIT
THE JENIFER BUILDING
400 SEVENTH STREET, N.W.
WASHINGTON, D.C. 20004

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