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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
03/22/1994
Application #:
07897768
Filing Dt:
06/12/1992
Inventors:
HONGQING SHAN, DONALD W. JILLIE JR.
Title:
PROCESS FOR ETCHING SILICON DIOXIDE LAYER WITHOUT MICRO MASKING EFFECT
Assignment: 1
Reel/Frame:
006180/0625Recorded: 06/12/1992Pages: 2
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST.
Assignors:
Exec Dt:
06/08/1992
Exec Dt:
06/08/1992
Assignee:
2200 MISSION COLLEGE BOULEVARD
SANTA CLARA, CALIFORNIA 95052-8119
Correspondent:
KEITH G. ASKOFF
BLAKELY SOKOLOFF TAYLOR & ZAFMAN
12400 WILSHIRE BOULEVARD, SEVENTH FLOOR
LOS ANGELES, CA 90025

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