Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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01/31/1995
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Application #:
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07652339
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Filing Dt:
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02/07/1991
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Inventors:
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JACK O. CHU, CHANG-MING HSIEH, VICTOR R. NASTASI, MARTIN REVITZ, PAUL A. RONSHEIM
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Title:
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METHOD OF FORMING A DOPED REGION IN A SEMICONDUCTOR SUBSTRATE UTILIZING A SACRIFICIAL EPITAXIAL SILICON LAYER
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST.
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| JEFFREY L. BRANDT |
| IBM CORP., DEPT 18G/BLDG 300-482 |
| ROUTE 52 |
| HOPEWELL JUNCTION, NY 12533-9988 |
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