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Patent Assignment Abstract of Title
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Total Assignments: 2
Patent #:
Issue Dt:
03/21/1995
Application #:
08094337
Filing Dt:
07/20/1993
Inventors:
KONRAD HIEBER, JASPER V. TOMKEWITSCH, OSWALD SPINDLER, HELMUTH TREICHEL et al
Title:
METHOD FOR LOCALLY AND GLOBALLY PLANARIZING CHEMICAL VAPOR DEPOSITION OF SIO2 LAYERS ONTO STRUCTURED SILICON SUBSTRATES
Assignment: 1
Reel/Frame:
006698/0190Recorded: 09/20/1993Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
09/10/1993
Exec Dt:
09/10/1993
Exec Dt:
09/10/1993
Exec Dt:
09/03/1993
Exec Dt:
09/03/1993
Exec Dt:
09/10/1993
Assignee:
WITTELSBACKERPLATZ 2
80333 MUNICH, GERMANY
Correspondent:
BRIAN M. MATTSON
HILL, STEADMAN & SIMPSON P.C.
85TH LFOOR SEARS TOWER
233 S. WACKER DRIVE
CHICAGO, IL 60606
Assignment: 2
Reel/Frame:
026358/0703Recorded: 05/31/2011Pages: 26
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignor:
Exec Dt:
03/31/1999
Assignee:
AM CAMPEON 1-12
D-85579 NEUBIBERG, GERMANY
Correspondent:
CPA GLOBAL
LIBERATION HOUSE
CASTLE STREET
ST. HELIER, JE1 1BL JERSEY

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