Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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06/04/1996
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Application #:
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08247705
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Filing Dt:
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05/23/1994
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Inventors:
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JOON HWANG, JAE S. IN
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Title:
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PHOTOMASK FOR FORMING HIGH RESOLUTION PHOTORESIST PATTERNS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| SAN 136-1, AMIRI BUBALEUB, ICHONKUN KYOUNGKIDO, KOREA 467-860 |
| KOREA, REPUBLIC OF |
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| MERCHANT, GOULD, SMITH, EDELL, WELTER & |
| SCHMIDT - CURTIS B. HAMRE |
| 3100 NORWEST CENTER |
| 90 SOUTH SEVENTH STREET |
| MINNEAPOLIS, MN 55402-4131 |
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