Patent Assignment Abstract of Title
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Total Assignments:
3
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Patent #:
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Issue Dt:
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07/30/1996
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Application #:
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08046728
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Filing Dt:
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04/16/1993
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Inventors:
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AKIHIKO IGAWA, MASATO NISHIKAWA, GEORG PAWLOWSKI, RALPH DAMMEL
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Title:
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NEGATIVE PHOTORESIST COMPOSITIONS COMPRISING A PHOTOSENSITIVE COMPOUND AN ALKOXYMETHYLATED MELAMINE AND NOVOLAK RESIN
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST.
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| 10-16, AKASAKA 8-CHOME, MINATO-KU |
| TOKYO, JAPAN |
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| RICHARD L. SCHWAAB |
| FOLEY & LARDNER |
| 3000 K STREET, N.W., SUITE 500 |
| WASHINGTON, D.C. 20007-5109 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| P.O. BOX 662, ROAD TOWN |
| CITCO BUILDING, WICKHAMS CAY |
| TORTOLA, VIRGIN ISLANDS, BRITISH |
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| CLARIANT CORPORATION |
| SCOTT E. HANF |
| 4331 CHESAPEAKE DRIVE |
| CHARLOTTE, NORTH CAROLINA 28216 |
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Assignment:
3
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 70 MEISTER AVENUE |
| SOMERVILLE, NEW JERSEY 08876 |
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| ALAN P. KASS |
| 70 MEISTER AVENUE |
| SOMERVILLE, NJ 08876 |
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