Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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09/14/1999
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Application #:
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08621648
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Filing Dt:
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03/26/1996
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Inventors:
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KEITA SAKAI, KEIKO CHIBA, HIROSHI MAEHARA
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Title:
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RESIST SOLUTION FOR PHOTOLITHOGRAPHY INCLUDING A BASE RESIN AND AN OXYGEN-FREE OR LOW-OXYGEN SOLVENT
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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30-2, SHIMOMARUKO 3-CHOME, OHTA-KU |
TOKYO, JAPAN |
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FITZPATRICK, CELLA, HARPER & SCINTO |
277 PARK AVENUE |
NEW YORK 10172-0194 |
ATTN: STEVEN E. WARNER |
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