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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
6071372
Issue Dt:
06/06/2000
Application #:
08869798
Filing Dt:
06/05/1997
Inventors:
YAN YE, DONALD OLGADO, AVI TEPMAN, DIANA MA, GERALD YIN, PETER LOEWENHARDT, JENG H. HAUNG et al
Title:
RF PLASMA ETCH REACTOR WITH INTERNAL INDUCTIVE COIL ANTENNA AND ELECTRICALLY CONDUCTIVE CHAMBER WALLS
Assignment: 1
Reel/Frame:
008925/0534Recorded: 12/15/1997Pages: 3
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
YE, YAN
Exec Dt:
11/25/1997
OLGADO, DONLAD
Exec Dt:
11/26/1997
TEPMAN, AVI
Exec Dt:
11/26/1997
MA, DIANA
Exec Dt:
12/02/1997
YIN, GERALD
Exec Dt:
11/29/1997
LOEWENHARDT, PETER
Exec Dt:
12/03/1997
HWANG, JENG
Exec Dt:
12/03/1997
MAK, STEVE
Exec Dt:
12/09/1997
Assignee:
APPLIED MATERIALS, INC.
P.O. BOX 450A
LEGAL DEPARTMENT
SANTA CLARA, CALIFORNIA 95052
Correspondent:
APPLIED MATERIALS, INC.
ROBERT M. WALLACE
LEGAL DEPARTMENT
P.O. BOX 450A
SANTA CLARA, CA 95052

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