Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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11/07/2000
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Application #:
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09345098
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Filing Dt:
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06/30/1999
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Inventors:
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KEN AIHARA, HIROSHI TAKENO
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Title:
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METHOD FOR HEAT TREATMENT OF SILICON SUBSTRATE, SUBSTRATE TREATED BY THE METHOD, AND EPITAXIAL WAFER UTILIZING THE SUBSTRATE
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 4-2, MARUNOUCHI 1-CHOME |
| CHIYODA-KU, TOKYO, JAPAN |
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| LOEB & LOEB LLP |
| WILLIAM H. WRIGHT, ESQ. |
| 10100 SANTA MONICA BLVD., 22ND FLOOR |
| LOS ANGELES, CALIFORNIA 90067-4164 |
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