Patent Assignment Abstract of Title
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Total Assignments:
4
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Patent #:
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Issue Dt:
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03/27/2001
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Application #:
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09065567
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Filing Dt:
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04/24/1998
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Inventors:
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SATOSHI TAKECHI, ISAMU HANYU
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Title:
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CHEMICALLY AMPLIFIED RESIST MATERIAL AND PROCESS FOR THE FORMATION OF RESIST PATTERNS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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1-1, KAMIKODANAKA 4-CHOME, NAKAHARA-KU |
KAWASAKI-SHI KANAGAWA 211-8588, JAPAN |
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ARMSTRONG, WESTERMAN HATTORI, ET AL. |
1725 K STREET, N.W. |
SUITE 1000 |
WASHINGTON, DC 20006 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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7-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU |
TOKYO, JAPAN 163-0722 |
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KRATZ, QUINTOS & HANSON, LLP |
1420 K STREET, N.W. |
SUITE 400 |
WASHINGTON, DC 20005 |
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Assignment:
3
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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2-10-23 SHIN-YOKOHAMA, KOHOKU-KU, YOKOHAMA-SHI |
KANAGAWA 222-0033, JAPAN |
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KRATZ, QUINTOS & HANSON, LLP |
1420 K STREET, N.W. |
4TH FLOOR |
WASHINGTON, DC 20005 |
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Assignment:
4
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2-100-45 SHIN-YOKOHAMA, KOHOKU-KU |
YOKOHAMA-SHI, KANAGAWA, JAPAN 222-0033 |
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WESTERMAN, HATTORI, DANIELS AND ADRIAN |
1250 CONNECTICUT AVENUE, NW |
SUITE 700 |
WASHINGTON, DC 20036 |
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